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US4364072A
(en)
*
|
1978-03-17 |
1982-12-14 |
Zaidan Hojin Handotai Kenkyu Shinkokai |
Static induction type semiconductor device with multiple doped layers for potential modification
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US4514747A
(en)
*
|
1978-08-07 |
1985-04-30 |
Hitachi, Ltd. |
Field controlled thyristor with double-diffused source region
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JPS6046551B2
(ja)
*
|
1978-08-07 |
1985-10-16 |
株式会社日立製作所 |
半導体スイツチング素子およびその製法
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JPS55105457U
(ja)
*
|
1979-01-16 |
1980-07-23 |
|
|
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JPS6016753B2
(ja)
*
|
1979-01-19 |
1985-04-27 |
株式会社日立製作所 |
半導体スイツチング素子およびその制御方法
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JPS5599774A
(en)
*
|
1979-01-26 |
1980-07-30 |
Semiconductor Res Found |
Electrostatic induction type thyristor
|
|
DE3051162C2
(de)
*
|
1979-01-26 |
1995-02-09 |
Zaidan Hojin Handotai Kenkyu |
Statischer Induktionsthyristor
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JPS55128870A
(en)
*
|
1979-03-26 |
1980-10-06 |
Semiconductor Res Found |
Electrostatic induction thyristor and semiconductor device
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US4937644A
(en)
*
|
1979-11-16 |
1990-06-26 |
General Electric Company |
Asymmetrical field controlled thyristor
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EP0029932B1
(en)
*
|
1979-11-16 |
1984-08-15 |
General Electric Company |
Asymmetrical field controlled thyristor
|
|
JPS5676574A
(en)
*
|
1979-11-26 |
1981-06-24 |
Semiconductor Res Found |
Schottky injection electrode type semiconductor device
|
|
JPS5824018B2
(ja)
*
|
1979-12-21 |
1983-05-18 |
富士通株式会社 |
バイポ−ラicの製造方法
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|
FR2480501A1
(fr)
*
|
1980-04-14 |
1981-10-16 |
Thomson Csf |
Dispositif semi-conducteur a grille profonde accessible par la surface et procede de fabrication
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|
FR2480502A1
(fr)
*
|
1980-04-14 |
1981-10-16 |
Thomson Csf |
Dispositif semi-conducteur a grille profonde, son application a une diode blocable, et procede de fabrication
|
|
DE3024015A1
(de)
*
|
1980-06-26 |
1982-01-07 |
Siemens AG, 1000 Berlin und 8000 München |
Steuerbarer halbleiterschalter
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|
JPS5778173A
(en)
*
|
1980-11-04 |
1982-05-15 |
Hitachi Ltd |
Semiconductor device and manufacture thereof
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|
JPS5788771A
(en)
*
|
1980-11-21 |
1982-06-02 |
Semiconductor Res Found |
Electrostatic induction thyristor
|
|
JPS57117276A
(en)
*
|
1981-01-14 |
1982-07-21 |
Hitachi Ltd |
Semiconductor device
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US4454523A
(en)
*
|
1981-03-30 |
1984-06-12 |
Siliconix Incorporated |
High voltage field effect transistor
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JPS5850775A
(ja)
*
|
1981-09-19 |
1983-03-25 |
Mitsubishi Electric Corp |
静電誘導型サイリスタ
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US4782379A
(en)
*
|
1981-11-23 |
1988-11-01 |
General Electric Company |
Semiconductor device having rapid removal of majority carriers from an active base region thereof at device turn-off and method of fabricating this device
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US4751556A
(en)
*
|
1984-03-29 |
1988-06-14 |
Gte Laboratories Incorporated |
Junction field effect transistor
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JPH0682833B2
(ja)
*
|
1985-02-08 |
1994-10-19 |
株式会社東芝 |
サイリスタの製造方法
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US4757025A
(en)
*
|
1985-03-25 |
1988-07-12 |
Motorola Inc. |
Method of making gate turn off switch with anode short and buried base
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JPS624368A
(ja)
*
|
1985-06-28 |
1987-01-10 |
シ−メンス、アクチエンゲゼルシヤフト |
サイリスタ
|
|
DE3531631A1
(de)
*
|
1985-09-05 |
1987-03-05 |
Licentia Gmbh |
Asymmetrischer thyristor und verfahren zu seiner herstellung
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US4752818A
(en)
*
|
1985-09-28 |
1988-06-21 |
Kabushiki Kaisha Toyota Chuo Kenkyusho |
Semiconductor device with multiple recombination center layers
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|
EP0224757B1
(de)
*
|
1985-11-29 |
1992-07-15 |
BBC Brown Boveri AG |
Rückwärtsleitender Thyristor
|
|
EP0230278A3
(de)
*
|
1986-01-24 |
1989-09-06 |
Siemens Aktiengesellschaft |
Thyristor mit integrierter Stromversorgung für eine zugeordnete Schaltungseinheit und Verfahren zu seiner Herstellung
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JPS62189781A
(ja)
*
|
1986-02-17 |
1987-08-19 |
Kokuritsu Kogai Kenkyusho |
レ−ザ−共振器
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US4982258A
(en)
*
|
1988-05-02 |
1991-01-01 |
General Electric Company |
Metal oxide semiconductor gated turn-off thyristor including a low lifetime region
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US4963950A
(en)
*
|
1988-05-02 |
1990-10-16 |
General Electric Company |
Metal oxide semiconductor gated turn-off thyristor having an interleaved structure
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US5192696A
(en)
*
|
1992-01-15 |
1993-03-09 |
Gte Laboratories Incorporated |
Field effect transistor and method of fabricating
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US5466951A
(en)
*
|
1993-12-08 |
1995-11-14 |
Siemens Aktiengesellschaft |
Controllable power semiconductor element with buffer zone and method for the manufacture thereof
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SE9601172D0
(sv)
*
|
1996-03-27 |
1996-03-27 |
Abb Research Ltd |
Insulated gate bipolar transistor having a trench and a method for procuction thereof
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US5880513A
(en)
*
|
1996-04-18 |
1999-03-09 |
Harris Corporation |
Asymmetric snubber resistor
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US5909039A
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*
|
1996-04-24 |
1999-06-01 |
Abb Research Ltd. |
Insulated gate bipolar transistor having a trench
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US6011279A
(en)
*
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1997-04-30 |
2000-01-04 |
Cree Research, Inc. |
Silicon carbide field controlled bipolar switch
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DE19837944A1
(de)
*
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1998-08-21 |
2000-02-24 |
Asea Brown Boveri |
Verfahren zur Fertigung eines Halbleiterbauelements
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US7485920B2
(en)
*
|
2000-06-14 |
2009-02-03 |
International Rectifier Corporation |
Process to create buried heavy metal at selected depth
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JP2002184952A
(ja)
*
|
2000-12-15 |
2002-06-28 |
Shindengen Electric Mfg Co Ltd |
半導体装置、半導体装置の製造方法
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JP4458740B2
(ja)
*
|
2002-09-13 |
2010-04-28 |
株式会社アルバック |
バイアススパッタ成膜方法及びバイアススパッタ成膜装置
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DE602004018614D1
(de)
*
|
2003-02-18 |
2009-02-05 |
Nxp Bv |
Halbleiterbauelement und verfahren zur herstellung eines solchen bauelements
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US7038260B1
(en)
*
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2003-03-04 |
2006-05-02 |
Lovoltech, Incorporated |
Dual gate structure for a FET and method for fabricating same
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US7750426B2
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2007-05-30 |
2010-07-06 |
Intersil Americas, Inc. |
Junction barrier Schottky diode with dual silicides
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US8368166B2
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2007-05-30 |
2013-02-05 |
Intersil Americas Inc. |
Junction barrier Schottky diode
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JP2013149956A
(ja)
*
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2011-12-22 |
2013-08-01 |
Ngk Insulators Ltd |
半導体装置
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JP5820311B2
(ja)
*
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2012-03-02 |
2015-11-24 |
ルネサスエレクトロニクス株式会社 |
半導体装置
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