JPS5750573A - Method for coating resist - Google Patents

Method for coating resist

Info

Publication number
JPS5750573A
JPS5750573A JP12757980A JP12757980A JPS5750573A JP S5750573 A JPS5750573 A JP S5750573A JP 12757980 A JP12757980 A JP 12757980A JP 12757980 A JP12757980 A JP 12757980A JP S5750573 A JPS5750573 A JP S5750573A
Authority
JP
Japan
Prior art keywords
resist
solvent
evaporate
stopped
rotated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12757980A
Other languages
Japanese (ja)
Inventor
Hisashi Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP12757980A priority Critical patent/JPS5750573A/en
Publication of JPS5750573A publication Critical patent/JPS5750573A/en
Pending legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a uniform resist film by allowing the solvent of high polymer resist to evaporate while rotation is stopped or lowered of the number of revolutions until the solvent evaporates in coating of positive type resist used for working of LSIs and the like.
CONSTITUTION: High polymer resist such as polymethyl methacrylate of ≥300,000 average mol. wts. is dissolved in a solvent of relatively low rates of evaporation such as ethyl cellosolve acetate, whereby a resist soln. is prepd. A substrae made by vapor-depositing chrominum on glass made of "Pyrex" is set on a spinner, and the resist soln. is dropped onto the entire surface, after which it is rotated and is thence stopped of rotation or is rotated at decreased number of revolutions to allow the solvent of the resist to evaporate, whereby the uniform resist film is formed.
COPYRIGHT: (C)1982,JPO&Japio
JP12757980A 1980-09-11 1980-09-11 Method for coating resist Pending JPS5750573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12757980A JPS5750573A (en) 1980-09-11 1980-09-11 Method for coating resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12757980A JPS5750573A (en) 1980-09-11 1980-09-11 Method for coating resist

Publications (1)

Publication Number Publication Date
JPS5750573A true JPS5750573A (en) 1982-03-25

Family

ID=14963543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12757980A Pending JPS5750573A (en) 1980-09-11 1980-09-11 Method for coating resist

Country Status (1)

Country Link
JP (1) JPS5750573A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4741926A (en) * 1985-10-29 1988-05-03 Rca Corporation Spin-coating procedure
US4748053A (en) * 1983-12-08 1988-05-31 Hoya Corporation Method of forming a uniform resist film by selecting a duration of rotation
JPH03245875A (en) * 1990-02-21 1991-11-01 Mitsubishi Electric Corp Application of coating solution

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4748053A (en) * 1983-12-08 1988-05-31 Hoya Corporation Method of forming a uniform resist film by selecting a duration of rotation
US4741926A (en) * 1985-10-29 1988-05-03 Rca Corporation Spin-coating procedure
JPH03245875A (en) * 1990-02-21 1991-11-01 Mitsubishi Electric Corp Application of coating solution

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