JPS5750422A - Vapor phase growth device - Google Patents

Vapor phase growth device

Info

Publication number
JPS5750422A
JPS5750422A JP55126234A JP12623480A JPS5750422A JP S5750422 A JPS5750422 A JP S5750422A JP 55126234 A JP55126234 A JP 55126234A JP 12623480 A JP12623480 A JP 12623480A JP S5750422 A JPS5750422 A JP S5750422A
Authority
JP
Japan
Prior art keywords
pipe
stainless
reaction
thin
fouling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55126234A
Other languages
English (en)
Inventor
Yasuhiko Matsumoto
Shoji Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55126234A priority Critical patent/JPS5750422A/ja
Publication of JPS5750422A publication Critical patent/JPS5750422A/ja
Pending legal-status Critical Current

Links

Classifications

    • H10P14/3442—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • H10P14/24—
    • H10P14/3411—
    • H10P14/3444—

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP55126234A 1980-09-11 1980-09-11 Vapor phase growth device Pending JPS5750422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55126234A JPS5750422A (en) 1980-09-11 1980-09-11 Vapor phase growth device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55126234A JPS5750422A (en) 1980-09-11 1980-09-11 Vapor phase growth device

Publications (1)

Publication Number Publication Date
JPS5750422A true JPS5750422A (en) 1982-03-24

Family

ID=14930101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55126234A Pending JPS5750422A (en) 1980-09-11 1980-09-11 Vapor phase growth device

Country Status (1)

Country Link
JP (1) JPS5750422A (ja)

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