JPS5749226A - Single-crystallizing method for non-single crystalline semiconductor layer - Google Patents

Single-crystallizing method for non-single crystalline semiconductor layer

Info

Publication number
JPS5749226A
JPS5749226A JP12482480A JP12482480A JPS5749226A JP S5749226 A JPS5749226 A JP S5749226A JP 12482480 A JP12482480 A JP 12482480A JP 12482480 A JP12482480 A JP 12482480A JP S5749226 A JPS5749226 A JP S5749226A
Authority
JP
Japan
Prior art keywords
layer
crystalline
substrate
exposed
energy beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12482480A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0140485B2 (enrdf_load_stackoverflow
Inventor
Junji Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12482480A priority Critical patent/JPS5749226A/ja
Publication of JPS5749226A publication Critical patent/JPS5749226A/ja
Publication of JPH0140485B2 publication Critical patent/JPH0140485B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Recrystallisation Techniques (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP12482480A 1980-09-09 1980-09-09 Single-crystallizing method for non-single crystalline semiconductor layer Granted JPS5749226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12482480A JPS5749226A (en) 1980-09-09 1980-09-09 Single-crystallizing method for non-single crystalline semiconductor layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12482480A JPS5749226A (en) 1980-09-09 1980-09-09 Single-crystallizing method for non-single crystalline semiconductor layer

Publications (2)

Publication Number Publication Date
JPS5749226A true JPS5749226A (en) 1982-03-23
JPH0140485B2 JPH0140485B2 (enrdf_load_stackoverflow) 1989-08-29

Family

ID=14895008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12482480A Granted JPS5749226A (en) 1980-09-09 1980-09-09 Single-crystallizing method for non-single crystalline semiconductor layer

Country Status (1)

Country Link
JP (1) JPS5749226A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401683A (en) * 1987-12-04 1995-03-28 Agency Of Industrial Science And Technology Method of manufacturing a multi-layered semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401683A (en) * 1987-12-04 1995-03-28 Agency Of Industrial Science And Technology Method of manufacturing a multi-layered semiconductor substrate

Also Published As

Publication number Publication date
JPH0140485B2 (enrdf_load_stackoverflow) 1989-08-29

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