JPS5749226A - Single-crystallizing method for non-single crystalline semiconductor layer - Google Patents
Single-crystallizing method for non-single crystalline semiconductor layerInfo
- Publication number
- JPS5749226A JPS5749226A JP12482480A JP12482480A JPS5749226A JP S5749226 A JPS5749226 A JP S5749226A JP 12482480 A JP12482480 A JP 12482480A JP 12482480 A JP12482480 A JP 12482480A JP S5749226 A JPS5749226 A JP S5749226A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- crystalline
- substrate
- exposed
- energy beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Recrystallisation Techniques (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12482480A JPS5749226A (en) | 1980-09-09 | 1980-09-09 | Single-crystallizing method for non-single crystalline semiconductor layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12482480A JPS5749226A (en) | 1980-09-09 | 1980-09-09 | Single-crystallizing method for non-single crystalline semiconductor layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5749226A true JPS5749226A (en) | 1982-03-23 |
JPH0140485B2 JPH0140485B2 (enrdf_load_stackoverflow) | 1989-08-29 |
Family
ID=14895008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12482480A Granted JPS5749226A (en) | 1980-09-09 | 1980-09-09 | Single-crystallizing method for non-single crystalline semiconductor layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5749226A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401683A (en) * | 1987-12-04 | 1995-03-28 | Agency Of Industrial Science And Technology | Method of manufacturing a multi-layered semiconductor substrate |
-
1980
- 1980-09-09 JP JP12482480A patent/JPS5749226A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401683A (en) * | 1987-12-04 | 1995-03-28 | Agency Of Industrial Science And Technology | Method of manufacturing a multi-layered semiconductor substrate |
Also Published As
Publication number | Publication date |
---|---|
JPH0140485B2 (enrdf_load_stackoverflow) | 1989-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4751193A (en) | Method of making SOI recrystallized layers by short spatially uniform light pulses | |
US4323417A (en) | Method of producing monocrystal on insulator | |
US4490573A (en) | Solar cells | |
EP0033414A3 (en) | High repetition rate, uniform volume transverse electric discharger laser with pulse triggered multi-arc channel switching, and a method of producing solar voltaic cells using a pulsed laser beam | |
US4152536A (en) | Solar cells | |
JPS5673697A (en) | Manufacture of single crystal thin film | |
US4095329A (en) | Manufacture of semiconductor ribbon and solar cells | |
JPS5749226A (en) | Single-crystallizing method for non-single crystalline semiconductor layer | |
JPS5745920A (en) | Forming method for semiconductor single crystal by energy beam emission | |
JPS5598823A (en) | Manufacture of single crystal element | |
JPS5645047A (en) | Manufacture of semiconductor monocrystal film | |
JPS5680126A (en) | Formation of monocrystalline semiconductor | |
JPS5749225A (en) | Single-crystallizing method for non-single crystalline semiconductor layer | |
JPS5522811A (en) | Manufacturing of semiconductor apparatus | |
JPS57187936A (en) | Manufacture of 3-5 family compound semiconductor element | |
JPS56126915A (en) | Manufacture of semiconductor device | |
JPS5745921A (en) | Forming method for semiconductor single crystal layer formed with laser irradiation | |
JPS57100721A (en) | Manufacture of semiconductor device | |
Kachurin | Epitaxial Crystallization of GaP Films on Si by Nanosecond Laser Pulses | |
JPS575327A (en) | Manufacture of semiconductor device | |
JPS6142984A (ja) | 半導体レ−ザの製造方法 | |
JPS5749224A (en) | Semiconductor device | |
JPS59128292A (ja) | 薄膜の結晶化方法 | |
JPH0794766A (ja) | 薄膜多結晶シリコン光電変換装置及びその製造方法 | |
JPS6474783A (en) | Semiconductor light-emitting device |