JPS5737831A - Mask correcting method - Google Patents

Mask correcting method

Info

Publication number
JPS5737831A
JPS5737831A JP11315480A JP11315480A JPS5737831A JP S5737831 A JPS5737831 A JP S5737831A JP 11315480 A JP11315480 A JP 11315480A JP 11315480 A JP11315480 A JP 11315480A JP S5737831 A JPS5737831 A JP S5737831A
Authority
JP
Japan
Prior art keywords
film
pinhole
coloring matter
resist
matter film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11315480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237779B2 (enrdf_load_stackoverflow
Inventor
Fumio Hori
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11315480A priority Critical patent/JPS5737831A/ja
Publication of JPS5737831A publication Critical patent/JPS5737831A/ja
Publication of JPS6237779B2 publication Critical patent/JPS6237779B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP11315480A 1980-08-18 1980-08-18 Mask correcting method Granted JPS5737831A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11315480A JPS5737831A (en) 1980-08-18 1980-08-18 Mask correcting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11315480A JPS5737831A (en) 1980-08-18 1980-08-18 Mask correcting method

Publications (2)

Publication Number Publication Date
JPS5737831A true JPS5737831A (en) 1982-03-02
JPS6237779B2 JPS6237779B2 (enrdf_load_stackoverflow) 1987-08-14

Family

ID=14604927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11315480A Granted JPS5737831A (en) 1980-08-18 1980-08-18 Mask correcting method

Country Status (1)

Country Link
JP (1) JPS5737831A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725093A (en) * 1994-07-18 1998-03-10 Toshiba-Emi Limited Disk case

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725093A (en) * 1994-07-18 1998-03-10 Toshiba-Emi Limited Disk case

Also Published As

Publication number Publication date
JPS6237779B2 (enrdf_load_stackoverflow) 1987-08-14

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