JPS5735367A - Manufacture of integrated circuit - Google Patents
Manufacture of integrated circuitInfo
- Publication number
- JPS5735367A JPS5735367A JP11061080A JP11061080A JPS5735367A JP S5735367 A JPS5735367 A JP S5735367A JP 11061080 A JP11061080 A JP 11061080A JP 11061080 A JP11061080 A JP 11061080A JP S5735367 A JPS5735367 A JP S5735367A
- Authority
- JP
- Japan
- Prior art keywords
- type
- fixed
- transistor
- polycrystal silicon
- layer pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 229910052710 silicon Inorganic materials 0.000 abstract 3
- 239000010703 silicon Substances 0.000 abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/102—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including bipolar components
- H01L27/1022—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including bipolar components including bipolar transistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
PURPOSE:To eliminate transistor effect of an ion implanted layer by crossing polycrystal silicon layers on isolated diffused layer patterns beforehand. CONSTITUTION:The first type transistor Tr61 is formed and fixed by the first type diffused layer pattern 58 and the corssing of the polycrystal silicon layer patterns 59 and 60. A second type transistor Tr65 is formed and fixed by the second type diffused layer pattern 62 and the crossing of the polycrystal silicon layers 63 and 64. A high potential power source line 66 and a low potential power source line 67 are formed by a metallic wiring layer. First and second type switching contact 68 which connects the input signal lines for the first and second type Trs is formed and fixed. The transistor effect of the horizontal part of the first type Tr61 is eliminated by the ion implanted layer pattern.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11061080A JPS5735367A (en) | 1980-08-12 | 1980-08-12 | Manufacture of integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11061080A JPS5735367A (en) | 1980-08-12 | 1980-08-12 | Manufacture of integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5735367A true JPS5735367A (en) | 1982-02-25 |
Family
ID=14540184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11061080A Pending JPS5735367A (en) | 1980-08-12 | 1980-08-12 | Manufacture of integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5735367A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0316174A (en) * | 1989-03-17 | 1991-01-24 | Kawasaki Steel Corp | Fundamental cell and arrangement structure of fundamental cells |
US6230635B1 (en) * | 1996-12-27 | 2001-05-15 | Sumitomo Osaka Cement Co. Ltd. | Device and method for combustion of fuel |
-
1980
- 1980-08-12 JP JP11061080A patent/JPS5735367A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0316174A (en) * | 1989-03-17 | 1991-01-24 | Kawasaki Steel Corp | Fundamental cell and arrangement structure of fundamental cells |
US6230635B1 (en) * | 1996-12-27 | 2001-05-15 | Sumitomo Osaka Cement Co. Ltd. | Device and method for combustion of fuel |
US6389998B2 (en) | 1996-12-27 | 2002-05-21 | Sumitomo Osaka Cement Co., Ltd. | Device and method for combustion of fuel |
US6439140B2 (en) | 1996-12-27 | 2002-08-27 | Sumitomo Osaka Cement Co., Ltd. | Device and method for combustion of fuel |
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