JPS5734402A - Inspecting method for defect in circuit pattern - Google Patents
Inspecting method for defect in circuit patternInfo
- Publication number
- JPS5734402A JPS5734402A JP10928580A JP10928580A JPS5734402A JP S5734402 A JPS5734402 A JP S5734402A JP 10928580 A JP10928580 A JP 10928580A JP 10928580 A JP10928580 A JP 10928580A JP S5734402 A JPS5734402 A JP S5734402A
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- positons
- error
- pattern
- judged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10928580A JPS5734402A (en) | 1980-08-11 | 1980-08-11 | Inspecting method for defect in circuit pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10928580A JPS5734402A (en) | 1980-08-11 | 1980-08-11 | Inspecting method for defect in circuit pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5734402A true JPS5734402A (en) | 1982-02-24 |
Family
ID=14506289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10928580A Pending JPS5734402A (en) | 1980-08-11 | 1980-08-11 | Inspecting method for defect in circuit pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5734402A (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59232344A (ja) * | 1983-06-16 | 1984-12-27 | Hitachi Ltd | 配線パタ−ン検出装置 |
JPS6093305A (ja) * | 1983-10-27 | 1985-05-25 | Fujitsu Ltd | マスク検査方法 |
JPS61213612A (ja) * | 1985-03-19 | 1986-09-22 | Hitachi Ltd | プリント基板のパタ−ン検査装置 |
JPS6243505A (ja) * | 1985-08-21 | 1987-02-25 | Hitachi Ltd | 半導体ウエハ上の被検査パターンの欠陥検査方法およびその装置 |
US4699543A (en) * | 1986-02-10 | 1987-10-13 | Kajima Corporation | Slope paving machine |
JPS6358138A (ja) * | 1986-08-28 | 1988-03-12 | Sony Corp | パタ−ン検査装置 |
US4737920A (en) * | 1983-11-30 | 1988-04-12 | Nippon Kogaku K. K. | Method and apparatus for correcting rotational errors during inspection of reticles and masks |
KR100465684B1 (ko) * | 2001-12-13 | 2005-01-13 | 엘지전자 주식회사 | 이미지 센서의 위치조정 장치와 그 방법 |
-
1980
- 1980-08-11 JP JP10928580A patent/JPS5734402A/ja active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59232344A (ja) * | 1983-06-16 | 1984-12-27 | Hitachi Ltd | 配線パタ−ン検出装置 |
JPS6319855B2 (ja) * | 1983-06-16 | 1988-04-25 | Hitachi Ltd | |
JPS6093305A (ja) * | 1983-10-27 | 1985-05-25 | Fujitsu Ltd | マスク検査方法 |
JPH0417361B2 (ja) * | 1983-10-27 | 1992-03-25 | Fujitsu Ltd | |
US4737920A (en) * | 1983-11-30 | 1988-04-12 | Nippon Kogaku K. K. | Method and apparatus for correcting rotational errors during inspection of reticles and masks |
JPS61213612A (ja) * | 1985-03-19 | 1986-09-22 | Hitachi Ltd | プリント基板のパタ−ン検査装置 |
JPH0445043B2 (ja) * | 1985-03-19 | 1992-07-23 | Hitachi Ltd | |
JPS6243505A (ja) * | 1985-08-21 | 1987-02-25 | Hitachi Ltd | 半導体ウエハ上の被検査パターンの欠陥検査方法およびその装置 |
US4699543A (en) * | 1986-02-10 | 1987-10-13 | Kajima Corporation | Slope paving machine |
JPS6358138A (ja) * | 1986-08-28 | 1988-03-12 | Sony Corp | パタ−ン検査装置 |
KR100465684B1 (ko) * | 2001-12-13 | 2005-01-13 | 엘지전자 주식회사 | 이미지 센서의 위치조정 장치와 그 방법 |
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