JPS573214A - Manufacture of nagnetic head - Google Patents

Manufacture of nagnetic head

Info

Publication number
JPS573214A
JPS573214A JP7573080A JP7573080A JPS573214A JP S573214 A JPS573214 A JP S573214A JP 7573080 A JP7573080 A JP 7573080A JP 7573080 A JP7573080 A JP 7573080A JP S573214 A JPS573214 A JP S573214A
Authority
JP
Japan
Prior art keywords
wafers
track
couple
mold
restricting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7573080A
Other languages
Japanese (ja)
Inventor
Teruo Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP7573080A priority Critical patent/JPS573214A/en
Publication of JPS573214A publication Critical patent/JPS573214A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/1871—Shaping or contouring of the transducing or guiding surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To manufacture a magnetic head free from a fear of crosstalk by forming a common side groove for restricting the width of a track in a couple of core halves, and by butting and using a couple of wafer obtained from the core half. CONSTITUTION:One-side surfaces 3 and 4 of wafers 1 and 2 of single crystal ferrite are worked into mirror surfaces, which are arranged facing the surface 6 of a jig 5. Then, the wafers are united together with a molding material 7 by using a mold 8. The molded wafers 1 and 2 are taken out of the mold and in the mirror-finished surfaces, grooves 10 for restricting track width 9 are cut. According to a usual method, a winding groove, a glass insertion groove, etc., are made and after the wafers 1 and 2 are meltstuck together while butted so that their track widths coincide with each other, a tape contact surface is rounded by being polished and the body is sliced along the broken lines to obtain magnetic head cores.
JP7573080A 1980-06-04 1980-06-04 Manufacture of nagnetic head Pending JPS573214A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7573080A JPS573214A (en) 1980-06-04 1980-06-04 Manufacture of nagnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7573080A JPS573214A (en) 1980-06-04 1980-06-04 Manufacture of nagnetic head

Publications (1)

Publication Number Publication Date
JPS573214A true JPS573214A (en) 1982-01-08

Family

ID=13584672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7573080A Pending JPS573214A (en) 1980-06-04 1980-06-04 Manufacture of nagnetic head

Country Status (1)

Country Link
JP (1) JPS573214A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6062124A (en) * 1983-09-14 1985-04-10 Toshiba Corp Reactive-ion etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6062124A (en) * 1983-09-14 1985-04-10 Toshiba Corp Reactive-ion etching method
JPH0465526B2 (en) * 1983-09-14 1992-10-20 Tokyo Shibaura Electric Co

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