JPS5728328A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5728328A
JPS5728328A JP10345480A JP10345480A JPS5728328A JP S5728328 A JPS5728328 A JP S5728328A JP 10345480 A JP10345480 A JP 10345480A JP 10345480 A JP10345480 A JP 10345480A JP S5728328 A JPS5728328 A JP S5728328A
Authority
JP
Japan
Prior art keywords
reaction
opening
substrates
gas
paddle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10345480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6122454B2 (enrdf_load_stackoverflow
Inventor
Nobuo Kawase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10345480A priority Critical patent/JPS5728328A/ja
Publication of JPS5728328A publication Critical patent/JPS5728328A/ja
Publication of JPS6122454B2 publication Critical patent/JPS6122454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP10345480A 1980-07-28 1980-07-28 Manufacture of semiconductor device Granted JPS5728328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10345480A JPS5728328A (en) 1980-07-28 1980-07-28 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10345480A JPS5728328A (en) 1980-07-28 1980-07-28 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5728328A true JPS5728328A (en) 1982-02-16
JPS6122454B2 JPS6122454B2 (enrdf_load_stackoverflow) 1986-05-31

Family

ID=14354465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10345480A Granted JPS5728328A (en) 1980-07-28 1980-07-28 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5728328A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03297132A (ja) * 1990-04-16 1991-12-27 Nec Corp 半導体ウェハの熱処理炉

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03297132A (ja) * 1990-04-16 1991-12-27 Nec Corp 半導体ウェハの熱処理炉

Also Published As

Publication number Publication date
JPS6122454B2 (enrdf_load_stackoverflow) 1986-05-31

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