JPS5723216A - Manufacture of plasma reactor and semiconductor element - Google Patents
Manufacture of plasma reactor and semiconductor elementInfo
- Publication number
- JPS5723216A JPS5723216A JP9837480A JP9837480A JPS5723216A JP S5723216 A JPS5723216 A JP S5723216A JP 9837480 A JP9837480 A JP 9837480A JP 9837480 A JP9837480 A JP 9837480A JP S5723216 A JPS5723216 A JP S5723216A
- Authority
- JP
- Japan
- Prior art keywords
- noncrystalline
- film
- varied
- changing
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9837480A JPS5723216A (en) | 1980-07-17 | 1980-07-17 | Manufacture of plasma reactor and semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9837480A JPS5723216A (en) | 1980-07-17 | 1980-07-17 | Manufacture of plasma reactor and semiconductor element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5723216A true JPS5723216A (en) | 1982-02-06 |
JPS6322057B2 JPS6322057B2 (ja) | 1988-05-10 |
Family
ID=14218098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9837480A Granted JPS5723216A (en) | 1980-07-17 | 1980-07-17 | Manufacture of plasma reactor and semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5723216A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06291045A (ja) * | 1992-06-29 | 1994-10-18 | Nissin Electric Co Ltd | シリコン膜の形成方法 |
US5686349A (en) * | 1992-10-07 | 1997-11-11 | Sharp Kabushiki Kaisha | Fabrication of a thin film transistor and production of a liquid crystal display apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52140274A (en) * | 1976-05-19 | 1977-11-22 | Hitachi Ltd | Pressure-reduction vapor growth method |
JPS532076A (en) * | 1976-06-29 | 1978-01-10 | Fujitsu Ltd | Equipment construction method for vapor-growth process |
-
1980
- 1980-07-17 JP JP9837480A patent/JPS5723216A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52140274A (en) * | 1976-05-19 | 1977-11-22 | Hitachi Ltd | Pressure-reduction vapor growth method |
JPS532076A (en) * | 1976-06-29 | 1978-01-10 | Fujitsu Ltd | Equipment construction method for vapor-growth process |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06291045A (ja) * | 1992-06-29 | 1994-10-18 | Nissin Electric Co Ltd | シリコン膜の形成方法 |
US5686349A (en) * | 1992-10-07 | 1997-11-11 | Sharp Kabushiki Kaisha | Fabrication of a thin film transistor and production of a liquid crystal display apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6322057B2 (ja) | 1988-05-10 |
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