JPS57196262A - Electrophotographic photoreceptor - Google Patents
Electrophotographic photoreceptorInfo
- Publication number
- JPS57196262A JPS57196262A JP8074581A JP8074581A JPS57196262A JP S57196262 A JPS57196262 A JP S57196262A JP 8074581 A JP8074581 A JP 8074581A JP 8074581 A JP8074581 A JP 8074581A JP S57196262 A JPS57196262 A JP S57196262A
- Authority
- JP
- Japan
- Prior art keywords
- silicon hydride
- hydride layer
- film
- layer
- 30atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
PURPOSE:To improve the production speed of an electrophotographic photoreceptor and enhance the sensitization effect of the region of a long wavelength which is less in the single layer, by laminating an amorphous silicon hydride layer and a microcrystalline silicon hydride layer on a conductive base material. CONSTITUTION:A conductive substrate consisting of Al or the like is put in a vacuous reaction vessel, and gaseous silane (SiH4) is decomposed in a hydrogen flow by a high-frequency glow discharge to form an amorphous silicon hydride layer on the Al substrate. The film thickness is 3-30mu desirably, and the quantity of H included in the film is 15-30atom%. The silicon is used as the target to perform a high-frequency sputtering in a hydrogen flow, and a microcrystalline silicon hydride layer is formed at a normal temperature. The film thickness is 0.1-10mu desirably, and the content of hydrogen in the film is 15-30atom%. A photoreceptor having this two-layered structure has a high productivity and the resistance to impression, and the sensitization region is enlarged.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8074581A JPS57196262A (en) | 1981-05-29 | 1981-05-29 | Electrophotographic photoreceptor |
US06/382,285 US4560634A (en) | 1981-05-29 | 1982-05-26 | Electrophotographic photosensitive member using microcrystalline silicon |
DE8282104724T DE3279006D1 (en) | 1981-05-29 | 1982-05-28 | Electrophotographic photosensitive member |
EP82104724A EP0066812B1 (en) | 1981-05-29 | 1982-05-28 | Electrophotographic photosensitive member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8074581A JPS57196262A (en) | 1981-05-29 | 1981-05-29 | Electrophotographic photoreceptor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57196262A true JPS57196262A (en) | 1982-12-02 |
JPH0241742B2 JPH0241742B2 (en) | 1990-09-19 |
Family
ID=13726932
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8074581A Granted JPS57196262A (en) | 1981-05-29 | 1981-05-29 | Electrophotographic photoreceptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57196262A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6022382A (en) * | 1983-07-19 | 1985-02-04 | Toshiba Corp | Photoconductive member |
JPS61295577A (en) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | Photoconductive member |
JPS61295576A (en) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | Photoconductive member |
JPS61295574A (en) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | Photoconductive member |
-
1981
- 1981-05-29 JP JP8074581A patent/JPS57196262A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6022382A (en) * | 1983-07-19 | 1985-02-04 | Toshiba Corp | Photoconductive member |
JPS61295577A (en) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | Photoconductive member |
JPS61295576A (en) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | Photoconductive member |
JPS61295574A (en) * | 1985-06-25 | 1986-12-26 | Toshiba Corp | Photoconductive member |
Also Published As
Publication number | Publication date |
---|---|
JPH0241742B2 (en) | 1990-09-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS54145539A (en) | Electrophotographic image forming material | |
JPS6435421A (en) | Thin film transistor array | |
JPS54145540A (en) | Electrophotographic image forming material | |
JPS54145537A (en) | Preparation of electrophotographic image forming material | |
JPS57196262A (en) | Electrophotographic photoreceptor | |
GB2001947A (en) | Pulverulent coating material | |
JPS5744154A (en) | Electrophotographic image formation member | |
JPS57153427A (en) | Manufacture of thin film device | |
JPS57113296A (en) | Switching element | |
JPS5669875A (en) | Amorphous semiconductor solar cell | |
JPS5569149A (en) | Electrophotographic photosensitive plate | |
JPS5214600A (en) | Process for the production of a thin film of silicon carbide | |
JPS644083A (en) | Photovoltaic device | |
KR840000980A (en) | Manufacturing Method of Semiconductor Film | |
JPS56116037A (en) | Manufacture of electrophotographic receptor | |
JPS5723216A (en) | Manufacture of plasma reactor and semiconductor element | |
JPS57149751A (en) | Semiconductor device | |
JPS5651878A (en) | Manufacture of mis composition amorphous silicon solar cell | |
JPS5627136A (en) | Manufacture of photorecording thin film | |
JPS57113214A (en) | Manufacture of amorphous semiconductor film | |
JPS57153436A (en) | Semiconductor device | |
JPS5523025A (en) | Production of polycrystal silicon | |
JPS6451617A (en) | Manufacture of photoconductive member | |
KR870010638A (en) | Method of manufacturing metal-insulated semiconductor polycrystalline silicon solar cell | |
JPS56149749A (en) | Face discharge type gas discharge panel |