JPS5720770A - Apparatus and method for development - Google Patents
Apparatus and method for developmentInfo
- Publication number
- JPS5720770A JPS5720770A JP9613380A JP9613380A JPS5720770A JP S5720770 A JPS5720770 A JP S5720770A JP 9613380 A JP9613380 A JP 9613380A JP 9613380 A JP9613380 A JP 9613380A JP S5720770 A JPS5720770 A JP S5720770A
- Authority
- JP
- Japan
- Prior art keywords
- cup
- developer
- holes
- development
- spinner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/06—Apparatus for electrographic processes using a charge pattern for developing
- G03G15/10—Apparatus for electrographic processes using a charge pattern for developing using a liquid developer
- G03G15/101—Apparatus for electrographic processes using a charge pattern for developing using a liquid developer for wetting the recording material
Abstract
PURPOSE:To improve the uniformity of the development of positive resist by providing a cylindrical cup having plural holes on the side face of the rotating shaft of a spinner and dropping a developer from the holes through storing semiconductor wafers in the cup. CONSTITUTION:A cup 10 having plural holes on the side face are provided to the rotating shaft 1 of a spinner and silicone wafers 3 coated with poritive resist 4 are set inside the cup. When the cup is rotated at the rotational speed of several tens to hundreds rpm and the developer 6 is dropped from a nozzle 5 intermittently, some volume of developer stays in the cup 10 and the positive resist 4 flows from the holes 11 together with the developer 6. After dropping water as a rinsing solution, the cup is rotated at a high speed to dry the contents. Thus, uniform development is made available by dipping development.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9613380A JPS5720770A (en) | 1980-07-14 | 1980-07-14 | Apparatus and method for development |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9613380A JPS5720770A (en) | 1980-07-14 | 1980-07-14 | Apparatus and method for development |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5720770A true JPS5720770A (en) | 1982-02-03 |
Family
ID=14156886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9613380A Pending JPS5720770A (en) | 1980-07-14 | 1980-07-14 | Apparatus and method for development |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5720770A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393416A (en) * | 1989-09-06 | 1991-04-18 | Terada Denki Seisakusho:Kk | Floor wiring structure |
JPH0383422U (en) * | 1989-12-15 | 1991-08-26 |
-
1980
- 1980-07-14 JP JP9613380A patent/JPS5720770A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393416A (en) * | 1989-09-06 | 1991-04-18 | Terada Denki Seisakusho:Kk | Floor wiring structure |
JPH0383422U (en) * | 1989-12-15 | 1991-08-26 |
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