JPS57207492A - Forming method for organic high polymer resin pattern - Google Patents
Forming method for organic high polymer resin patternInfo
- Publication number
- JPS57207492A JPS57207492A JP56092298A JP9229881A JPS57207492A JP S57207492 A JPS57207492 A JP S57207492A JP 56092298 A JP56092298 A JP 56092298A JP 9229881 A JP9229881 A JP 9229881A JP S57207492 A JPS57207492 A JP S57207492A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- pgma
- film
- substrate
- optical absorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Color Television Image Signal Generators (AREA)
- Polymerisation Methods In General (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE: To form a minute pattern without pattern deforming, by performing heat processing after impregnating an optical absorbent to a radiant ray sensitive organic high polymer resin, in forming a filter with a prescribed pattern on a substrate of a solid-state image pickup element.
CONSTITUTION: In a solid-state image pickup element substrate 1, a photdetecting section, its accessory circuit and external lead 8 are formed on the substrate. A PGMA solution is coated on the substrate 1 to form a PGMA film as an organic resin film. The organic resin film is heated at 200°C for 30min. and the PGMA film is thermally cross-linked. Exposure is made with ultraviolet rays and the pattern of the PGMA film is formed by drying after the processing with a development liquid. An optical absorbent is impregnated in the PGMA film in a solution containing the optical absorbent at 60°C for 4min. The solution is quickly exhausted and the objective is dried to form the PGMA pattern containing the optical absorbent. Further, heat processing at 200°C for 15min. is performed. Thus, a color filter having a prescribed pattern can be obtained on the PGMA film 5 without deformed pattern.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56092298A JPS57207492A (en) | 1981-06-17 | 1981-06-17 | Forming method for organic high polymer resin pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56092298A JPS57207492A (en) | 1981-06-17 | 1981-06-17 | Forming method for organic high polymer resin pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57207492A true JPS57207492A (en) | 1982-12-20 |
Family
ID=14050499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56092298A Pending JPS57207492A (en) | 1981-06-17 | 1981-06-17 | Forming method for organic high polymer resin pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207492A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59109159U (en) * | 1983-01-13 | 1984-07-23 | ソニー株式会社 | solid-state image sensor |
-
1981
- 1981-06-17 JP JP56092298A patent/JPS57207492A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59109159U (en) * | 1983-01-13 | 1984-07-23 | ソニー株式会社 | solid-state image sensor |
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