JPS57206172A - Electrostatic deflecting device for charged particle beam - Google Patents
Electrostatic deflecting device for charged particle beamInfo
- Publication number
- JPS57206172A JPS57206172A JP9090081A JP9090081A JPS57206172A JP S57206172 A JPS57206172 A JP S57206172A JP 9090081 A JP9090081 A JP 9090081A JP 9090081 A JP9090081 A JP 9090081A JP S57206172 A JPS57206172 A JP S57206172A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- deflecting
- main
- voltage
- application
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Details Of Television Scanning (AREA)
Abstract
PURPOSE:To miniaturize the titled deflecting device as well as to simplify the matching of axes between the main and secondary deflecting devices and to decrease the aberration caused by the secondary deflection, by forming the main and secondary deflecting devices into a body. CONSTITUTION:The electrostatic deflecting electrodes D1-D8 having the same shape of a cylinder, rod, flat plate, circular arc, etc. are distributed opposite to each other with a 45 deg. center angle and along the beam projecting paths. A group of the electrodes D1, D3, D5 and D7 among 8 electrodes in all is used for the main deflection purpose with application of a high level of deflecting voltage. While the rest electrodes D2, D4, D6 and D8 are used for the secondary deflection purpose with application of a low level of voltage. With application of the voltage, these main and secondary deflecting electrodes form an electric field of a simple addition of equivalent electric fields at the center part of these electrodes if the partner electrodes are earthed to each other. In such way, the main and secondary deflecting devices are formed into a body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9090081A JPS57206172A (en) | 1981-06-15 | 1981-06-15 | Electrostatic deflecting device for charged particle beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9090081A JPS57206172A (en) | 1981-06-15 | 1981-06-15 | Electrostatic deflecting device for charged particle beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57206172A true JPS57206172A (en) | 1982-12-17 |
Family
ID=14011266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9090081A Pending JPS57206172A (en) | 1981-06-15 | 1981-06-15 | Electrostatic deflecting device for charged particle beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57206172A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6288247A (en) * | 1985-10-14 | 1987-04-22 | Fujitsu Ltd | Electron beam exposure device |
EP1033738A1 (en) * | 1999-02-24 | 2000-09-06 | Leica Microsystems Lithography GmbH | Device for the electrostatic deflection of a particle beam |
EP1688964A2 (en) * | 2005-02-04 | 2006-08-09 | Leica Microsystems Lithography GmbH | Electrostatic deflection system for corpuscular radiation |
JP2017143034A (en) * | 2016-02-12 | 2017-08-17 | 東方晶源微電子科技(北京)有限公司 | Image acquisition method and electron beam inspection/length measurement device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5548610B2 (en) * | 1973-05-18 | 1980-12-06 |
-
1981
- 1981-06-15 JP JP9090081A patent/JPS57206172A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5548610B2 (en) * | 1973-05-18 | 1980-12-06 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6288247A (en) * | 1985-10-14 | 1987-04-22 | Fujitsu Ltd | Electron beam exposure device |
EP1033738A1 (en) * | 1999-02-24 | 2000-09-06 | Leica Microsystems Lithography GmbH | Device for the electrostatic deflection of a particle beam |
EP1688964A2 (en) * | 2005-02-04 | 2006-08-09 | Leica Microsystems Lithography GmbH | Electrostatic deflection system for corpuscular radiation |
EP1688964A3 (en) * | 2005-02-04 | 2008-08-13 | Leica Microsystems Lithography GmbH | Electrostatic deflection system for corpuscular radiation |
US7491946B2 (en) | 2005-02-04 | 2009-02-17 | Leica Microsystems Lithography Gmbh | Electrostatic deflection system for corpuscular radiation |
JP2017143034A (en) * | 2016-02-12 | 2017-08-17 | 東方晶源微電子科技(北京)有限公司 | Image acquisition method and electron beam inspection/length measurement device |
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