EP1688964A3 - Electrostatic deflection system for corpuscular radiation - Google Patents

Electrostatic deflection system for corpuscular radiation Download PDF

Info

Publication number
EP1688964A3
EP1688964A3 EP06002118A EP06002118A EP1688964A3 EP 1688964 A3 EP1688964 A3 EP 1688964A3 EP 06002118 A EP06002118 A EP 06002118A EP 06002118 A EP06002118 A EP 06002118A EP 1688964 A3 EP1688964 A3 EP 1688964A3
Authority
EP
European Patent Office
Prior art keywords
deflection system
electrostatic deflection
symmetrical arrangement
corpuscular radiation
axially symmetrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06002118A
Other languages
German (de)
French (fr)
Other versions
EP1688964A2 (en
Inventor
Stefan Dr. Risse
Thomas Dr. Peschel
Christoph Damm
Andreas Gebhardt
Mathias Rohde
Christoph Schenk
Thomas Dr. Elster
Hans-Joachim Döring
Gerhard Schubert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Electron Beam GmbH
Original Assignee
Vistec Electron Beam GmbH
Vistec Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vistec Electron Beam GmbH, Vistec Lithography Ltd filed Critical Vistec Electron Beam GmbH
Publication of EP1688964A2 publication Critical patent/EP1688964A2/en
Publication of EP1688964A3 publication Critical patent/EP1688964A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Micromachines (AREA)

Abstract

Die Erfindung betrifft elektrostatische Ablenksysteme für Korpuskularstrahlen, die insbesondere für mikro- und nanostrukturierte Anwendungen in Lithographieanlagen oder Messgeräten einsetzbar sind. Gemäß der gestellten Aufgabe sollen die einzelnen Elektroden eines solchen Ablenksystems dauerhaft eine sehr genaue axialsymmetrische Anordnung zueinander aufweisen und beibehalten. Bei dem erfindungsgemäßen elektrostatischen Ablenksystem sind stabförmige Elektroden in axialsymmetrischer Anordnung in einem innen hohlen Träger gehalten, durch den ein Korpuskularstrahl gerichtet werden kann. Der Träger ist dabei aus mindestens zwei und maximal vier miteinander verbindbaren Trägerelementen gebildet.

Figure imgaf001
The invention relates to electrostatic deflection systems for corpuscular beams, which can be used in particular for microstructured and nanostructured applications in lithography systems or measuring devices. According to the stated object, the individual electrodes of such a deflection system should permanently have and maintain a very precise, axially symmetrical arrangement with respect to each other. In the electrostatic deflection system according to the invention rod-shaped electrodes are held in an axially symmetrical arrangement in an internally hollow support, through which a particle beam can be directed. The carrier is formed from at least two and a maximum of four interconnectable carrier elements.
Figure imgaf001
EP06002118A 2005-02-04 2006-02-02 Electrostatic deflection system for corpuscular radiation Withdrawn EP1688964A3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005005801A DE102005005801B4 (en) 2005-02-04 2005-02-04 Electrostatic deflection system for corpuscular radiation

Publications (2)

Publication Number Publication Date
EP1688964A2 EP1688964A2 (en) 2006-08-09
EP1688964A3 true EP1688964A3 (en) 2008-08-13

Family

ID=36580030

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06002118A Withdrawn EP1688964A3 (en) 2005-02-04 2006-02-02 Electrostatic deflection system for corpuscular radiation

Country Status (4)

Country Link
US (1) US7491946B2 (en)
EP (1) EP1688964A3 (en)
JP (1) JP2006216558A (en)
DE (1) DE102005005801B4 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7741610B2 (en) * 2007-11-01 2010-06-22 Oy Ajat Ltd. CdTe/CdZnTe radiation imaging detector and high/biasing voltage means

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3497744A (en) * 1966-08-11 1970-02-24 Philips Corp Cathode-ray tube using a quadrupolar electrostatic lens to correct orthogonality errors
JPS57206172A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Electrostatic deflecting device for charged particle beam
DE3138898A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Electrostatic deflection system
JPS59180943A (en) * 1983-03-30 1984-10-15 Hitachi Ltd Electrostatic deflector for charged particle beam
JPH02247966A (en) * 1989-03-20 1990-10-03 Fujitsu Ltd Electrostatic deflection apparatus
JPH05129193A (en) * 1991-11-01 1993-05-25 Fujitsu Ltd Charged beam exposure device
US5929452A (en) * 1997-03-18 1999-07-27 Kabushiki Kaisha Toshiba Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same
EP0999572A2 (en) * 1998-11-02 2000-05-10 Advantest Corporation Electrostatic deflector for electron beam exposure apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2882412B2 (en) * 1989-01-20 1999-04-12 富士通株式会社 Electron beam exposure equipment
JP2900283B2 (en) * 1990-08-28 1999-06-02 千代田化工建設株式会社 Control method of exhaust gas ventilator of flue gas desulfurization unit
JPH086317Y2 (en) * 1991-04-11 1996-02-21 東芝機械株式会社 Multi-pole opposed electrostatic deflector
JPH04328236A (en) * 1991-04-26 1992-11-17 Fujitsu Ltd Electron beam exposure device
JPH09139184A (en) * 1995-11-15 1997-05-27 Nikon Corp Manufacture of electrostatic deflection unit
JPH09293472A (en) * 1996-04-26 1997-11-11 Fujitsu Ltd Charged particle beam exposure device, its exposure method, and its manufacture
FR2778180B3 (en) * 1998-04-29 2000-05-19 Saint Gobain Vitrage TAPERED FIBERGLASS AND PROCESS FOR PRODUCING THE SAME
JP2000011937A (en) * 1998-06-26 2000-01-14 Advantest Corp Electrostatic deflector of electron beam exposure device
JP2000138036A (en) * 1998-11-02 2000-05-16 Advantest Corp Electrostatic deflecting system for electron beam irradiating device
DE19907858C1 (en) * 1999-02-24 2000-10-05 Leica Microsys Lithography Ltd Device for the electrostatic deflection of a corpuscular beam

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3497744A (en) * 1966-08-11 1970-02-24 Philips Corp Cathode-ray tube using a quadrupolar electrostatic lens to correct orthogonality errors
JPS57206172A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Electrostatic deflecting device for charged particle beam
DE3138898A1 (en) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Electrostatic deflection system
JPS59180943A (en) * 1983-03-30 1984-10-15 Hitachi Ltd Electrostatic deflector for charged particle beam
JPH02247966A (en) * 1989-03-20 1990-10-03 Fujitsu Ltd Electrostatic deflection apparatus
JPH05129193A (en) * 1991-11-01 1993-05-25 Fujitsu Ltd Charged beam exposure device
US5929452A (en) * 1997-03-18 1999-07-27 Kabushiki Kaisha Toshiba Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same
EP0999572A2 (en) * 1998-11-02 2000-05-10 Advantest Corporation Electrostatic deflector for electron beam exposure apparatus

Also Published As

Publication number Publication date
DE102005005801A1 (en) 2006-08-17
DE102005005801B4 (en) 2007-08-09
EP1688964A2 (en) 2006-08-09
US7491946B2 (en) 2009-02-17
JP2006216558A (en) 2006-08-17
US20060192133A1 (en) 2006-08-31

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