JPS57192029A - Mask set and positioning method for mask - Google Patents
Mask set and positioning method for maskInfo
- Publication number
- JPS57192029A JPS57192029A JP56077212A JP7721281A JPS57192029A JP S57192029 A JPS57192029 A JP S57192029A JP 56077212 A JP56077212 A JP 56077212A JP 7721281 A JP7721281 A JP 7721281A JP S57192029 A JPS57192029 A JP S57192029A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- pointed ends
- masks
- displacement
- detected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To position the masks accurately in a short time by positioning the masks by the relative positions of mutual points formed by the pointed ends of the masks. CONSTITUTION:The first mask A takes the form of a star crossed alignment key with four pointed ends. The second mask B takes the form of an alignment key in which four isosceles triangles are each arranged so that a central axis has the angle of 90 deg. while the apices are mutually opposed. Dispacement in the left and right direction is detected at 5, 7 to the pointed ends, 1, 3 and one in the vertical direction at 8, 6 to 4, 2. Rotary displacement is detected through the displacement of the four pointed ends in the same direction of revolution. accordingly, the displacement of alignment of the mask A and the mask B is easily detected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077212A JPS57192029A (en) | 1981-05-20 | 1981-05-20 | Mask set and positioning method for mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077212A JPS57192029A (en) | 1981-05-20 | 1981-05-20 | Mask set and positioning method for mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57192029A true JPS57192029A (en) | 1982-11-26 |
Family
ID=13627517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56077212A Pending JPS57192029A (en) | 1981-05-20 | 1981-05-20 | Mask set and positioning method for mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192029A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6093511A (en) * | 1994-06-30 | 2000-07-25 | Fujitsu Limited | Method of manufacturing semiconductor device |
JP2017504014A (en) * | 2013-12-21 | 2017-02-02 | ケーエルエー−テンカー コーポレイション | Position sensitive substrate device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5394878A (en) * | 1977-01-31 | 1978-08-19 | Matsushita Electric Ind Co Ltd | Mask matching key |
JPS5454579A (en) * | 1977-10-11 | 1979-04-28 | Toshiba Corp | Exposure method |
JPS5651839A (en) * | 1979-10-05 | 1981-05-09 | Nec Corp | Semiconductor device |
-
1981
- 1981-05-20 JP JP56077212A patent/JPS57192029A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5394878A (en) * | 1977-01-31 | 1978-08-19 | Matsushita Electric Ind Co Ltd | Mask matching key |
JPS5454579A (en) * | 1977-10-11 | 1979-04-28 | Toshiba Corp | Exposure method |
JPS5651839A (en) * | 1979-10-05 | 1981-05-09 | Nec Corp | Semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6093511A (en) * | 1994-06-30 | 2000-07-25 | Fujitsu Limited | Method of manufacturing semiconductor device |
JP2017504014A (en) * | 2013-12-21 | 2017-02-02 | ケーエルエー−テンカー コーポレイション | Position sensitive substrate device |
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