JPS57192028A - Mask set and positioning method for mask - Google Patents

Mask set and positioning method for mask

Info

Publication number
JPS57192028A
JPS57192028A JP7721181A JP7721181A JPS57192028A JP S57192028 A JPS57192028 A JP S57192028A JP 7721181 A JP7721181 A JP 7721181A JP 7721181 A JP7721181 A JP 7721181A JP S57192028 A JPS57192028 A JP S57192028A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
mask
alignment
triangles
band region
displacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7721181A
Inventor
Takeshi Konuma
Toshio Sugawa
Hideki Yakida
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073Alignment marks and their environment
    • G03F9/7076Mark details, e.g. phase grating mark, temporary mark
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42Alignment or registration features, e.g. alignment marks on the mask substrates

Abstract

PURPOSE:To position the masks accurately in a short time by independently detecting the displacement of alignment of the second optical mask to the first optical mask by the positional displacement of the triangles of each alignment key. CONSTITUTION:The first mask A takes the form of the alignment key in which four quadrilaterals shape crossed band region. The second mask B takes the form of the alignment key in which four isosceles triangles are each arranged so that a central axis has the angle of 90 deg. while the apices are mutually opposed. The center of the band region of the mask A and the apices of the triangles of the mask B are conformed. Sides gamma1, gamma2 contacting with the end section of the band region of the mask A and the base B of the triangle of the mask B are conformed. Accordingly, the displacement of alignment of the masks A, B is easily detected.
JP7721181A 1981-05-20 1981-05-20 Mask set and positioning method for mask Pending JPS57192028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7721181A JPS57192028A (en) 1981-05-20 1981-05-20 Mask set and positioning method for mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7721181A JPS57192028A (en) 1981-05-20 1981-05-20 Mask set and positioning method for mask

Publications (1)

Publication Number Publication Date
JPS57192028A true true JPS57192028A (en) 1982-11-26

Family

ID=13627489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7721181A Pending JPS57192028A (en) 1981-05-20 1981-05-20 Mask set and positioning method for mask

Country Status (1)

Country Link
JP (1) JPS57192028A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459737A2 (en) * 1990-05-28 1991-12-04 Nec Corporation Reticle for a reduced projection exposure apparatus
JPH05109873A (en) * 1991-04-12 1993-04-30 Goldstar Electron Co Ltd Alignment method for semiconductor chip and laser repair target
US7046715B2 (en) * 2002-03-27 2006-05-16 Sharp Laboratories Of America, Inc. Method for suppressing energy spikes of a partially-coherent beam using triangular end-regions

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143770A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Mask aligning method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143770A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Mask aligning method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459737A2 (en) * 1990-05-28 1991-12-04 Nec Corporation Reticle for a reduced projection exposure apparatus
JPH05109873A (en) * 1991-04-12 1993-04-30 Goldstar Electron Co Ltd Alignment method for semiconductor chip and laser repair target
US7046715B2 (en) * 2002-03-27 2006-05-16 Sharp Laboratories Of America, Inc. Method for suppressing energy spikes of a partially-coherent beam using triangular end-regions

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