JPS57192028A - Mask set and positioning method for mask - Google Patents

Mask set and positioning method for mask

Info

Publication number
JPS57192028A
JPS57192028A JP56077211A JP7721181A JPS57192028A JP S57192028 A JPS57192028 A JP S57192028A JP 56077211 A JP56077211 A JP 56077211A JP 7721181 A JP7721181 A JP 7721181A JP S57192028 A JPS57192028 A JP S57192028A
Authority
JP
Japan
Prior art keywords
mask
alignment
triangles
band region
displacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56077211A
Other languages
Japanese (ja)
Inventor
Toshio Sugawa
Takeshi Konuma
Hideki Yakida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56077211A priority Critical patent/JPS57192028A/en
Publication of JPS57192028A publication Critical patent/JPS57192028A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates

Abstract

PURPOSE:To position the masks accurately in a short time by independently detecting the displacement of alignment of the second optical mask to the first optical mask by the positional displacement of the triangles of each alignment key. CONSTITUTION:The first mask A takes the form of the alignment key in which four quadrilaterals shape crossed band region. The second mask B takes the form of the alignment key in which four isosceles triangles are each arranged so that a central axis has the angle of 90 deg. while the apices are mutually opposed. The center of the band region of the mask A and the apices of the triangles of the mask B are conformed. Sides gamma1, gamma2 contacting with the end section of the band region of the mask A and the base B of the triangle of the mask B are conformed. Accordingly, the displacement of alignment of the masks A, B is easily detected.
JP56077211A 1981-05-20 1981-05-20 Mask set and positioning method for mask Pending JPS57192028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56077211A JPS57192028A (en) 1981-05-20 1981-05-20 Mask set and positioning method for mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56077211A JPS57192028A (en) 1981-05-20 1981-05-20 Mask set and positioning method for mask

Publications (1)

Publication Number Publication Date
JPS57192028A true JPS57192028A (en) 1982-11-26

Family

ID=13627489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56077211A Pending JPS57192028A (en) 1981-05-20 1981-05-20 Mask set and positioning method for mask

Country Status (1)

Country Link
JP (1) JPS57192028A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459737A2 (en) * 1990-05-28 1991-12-04 Nec Corporation Reticle for a reduced projection exposure apparatus
JPH05109873A (en) * 1991-04-12 1993-04-30 Goldstar Electron Co Ltd Aligning method for semiconductor chip and target for laser repair
US7046715B2 (en) * 2002-03-27 2006-05-16 Sharp Laboratories Of America, Inc. Method for suppressing energy spikes of a partially-coherent beam using triangular end-regions

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143770A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Mask aligning method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143770A (en) * 1976-05-26 1977-11-30 Hitachi Ltd Mask aligning method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459737A2 (en) * 1990-05-28 1991-12-04 Nec Corporation Reticle for a reduced projection exposure apparatus
JPH05109873A (en) * 1991-04-12 1993-04-30 Goldstar Electron Co Ltd Aligning method for semiconductor chip and target for laser repair
US7046715B2 (en) * 2002-03-27 2006-05-16 Sharp Laboratories Of America, Inc. Method for suppressing energy spikes of a partially-coherent beam using triangular end-regions

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