JPS57186373A - Semiconductor pressure sensor - Google Patents

Semiconductor pressure sensor

Info

Publication number
JPS57186373A
JPS57186373A JP7102581A JP7102581A JPS57186373A JP S57186373 A JPS57186373 A JP S57186373A JP 7102581 A JP7102581 A JP 7102581A JP 7102581 A JP7102581 A JP 7102581A JP S57186373 A JPS57186373 A JP S57186373A
Authority
JP
Japan
Prior art keywords
resistors
straight line
gage
change
pressure sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7102581A
Other languages
Japanese (ja)
Inventor
Masaru Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJI DENKI SOUGOU KENKYUSHO KK
Fuji Electric Co Ltd
Original Assignee
FUJI DENKI SOUGOU KENKYUSHO KK
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUJI DENKI SOUGOU KENKYUSHO KK, Fuji Electric Corporate Research and Development Ltd filed Critical FUJI DENKI SOUGOU KENKYUSHO KK
Priority to JP7102581A priority Critical patent/JPS57186373A/en
Publication of JPS57186373A publication Critical patent/JPS57186373A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

PURPOSE:To improve sensitivity by arranging the gage resistors of the semiconductor pressure sensor so that the change of the inside gage resistor reaches the maximum value and the change of the outside gage resistor the minimum value without being disposed onto one straight line. CONSTITUTION:The diaphragm surface of a pressure sensor is formed in the (1, (-1), 0) face of Si, the inside gage resistors 4 are arranged onto a diameter in the <1, (-1),)> dirction, and the outside gage resistors 3 are disposed onto a straight line 9 shown at an angle theta in predetermined relationship with the diameter in said direction at the distance of gamma from the center as the Poisson ratio V of Si or near the straight line in polar coordinates making the center of a diaphragm as a pole and a radius a in the <1, (-), 0> direction as an original line. The change of the inside gage resistors is maximum and the change of the outside gage resistors is minimum at that time, and the sensitivity of the sensor is improved when the sensor is connected by a conductive film through a conventional method. When the resistors 3 are mounted near the outer circumference of the straight line 9 and the resistors 3 and 4 are paralleled on production, the resistors 3 may be set up so as to cross the straight line 9.
JP7102581A 1981-05-12 1981-05-12 Semiconductor pressure sensor Pending JPS57186373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7102581A JPS57186373A (en) 1981-05-12 1981-05-12 Semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7102581A JPS57186373A (en) 1981-05-12 1981-05-12 Semiconductor pressure sensor

Publications (1)

Publication Number Publication Date
JPS57186373A true JPS57186373A (en) 1982-11-16

Family

ID=13448566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7102581A Pending JPS57186373A (en) 1981-05-12 1981-05-12 Semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPS57186373A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60243534A (en) * 1984-04-03 1985-12-03 エルサグ・インターナショナル・ビー・ブイ Diaphragm deflection sensor for molten silica diaphragm module
JPS6189137U (en) * 1984-11-16 1986-06-10

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60243534A (en) * 1984-04-03 1985-12-03 エルサグ・インターナショナル・ビー・ブイ Diaphragm deflection sensor for molten silica diaphragm module
JPH0528336B2 (en) * 1984-04-03 1993-04-26 Elsag Int Bv
JPS6189137U (en) * 1984-11-16 1986-06-10

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