JPS57184277A - Manufacture of semiconductor light emission device - Google Patents
Manufacture of semiconductor light emission deviceInfo
- Publication number
- JPS57184277A JPS57184277A JP6987281A JP6987281A JPS57184277A JP S57184277 A JPS57184277 A JP S57184277A JP 6987281 A JP6987281 A JP 6987281A JP 6987281 A JP6987281 A JP 6987281A JP S57184277 A JPS57184277 A JP S57184277A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- etching
- groove
- light emission
- semiconductor light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2081—Methods of obtaining the confinement using special etching techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2201—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure in a specific crystallographic orientation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/24—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a grooved structure, e.g. V-grooved, crescent active layer in groove, VSIS laser
Landscapes
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6987281A JPS57184277A (en) | 1981-05-08 | 1981-05-08 | Manufacture of semiconductor light emission device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6987281A JPS57184277A (en) | 1981-05-08 | 1981-05-08 | Manufacture of semiconductor light emission device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57184277A true JPS57184277A (en) | 1982-11-12 |
JPS6342872B2 JPS6342872B2 (enrdf_load_stackoverflow) | 1988-08-25 |
Family
ID=13415307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6987281A Granted JPS57184277A (en) | 1981-05-08 | 1981-05-08 | Manufacture of semiconductor light emission device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57184277A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018101675A (ja) * | 2016-12-20 | 2018-06-28 | Dowaエレクトロニクス株式会社 | 半導体発光素子およびその製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121693A (en) * | 1979-03-15 | 1980-09-18 | Tokyo Inst Of Technol | Manufacture of band-like semiconductor laser by selective melt-back process |
-
1981
- 1981-05-08 JP JP6987281A patent/JPS57184277A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121693A (en) * | 1979-03-15 | 1980-09-18 | Tokyo Inst Of Technol | Manufacture of band-like semiconductor laser by selective melt-back process |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018101675A (ja) * | 2016-12-20 | 2018-06-28 | Dowaエレクトロニクス株式会社 | 半導体発光素子およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6342872B2 (enrdf_load_stackoverflow) | 1988-08-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4136928A (en) | Optical integrated circuit including junction laser with oblique mirror | |
Soda et al. | GaInAsP/InP surface emitting injection lasers with short cavity length | |
JPS57170584A (en) | Semiconductor laser device | |
JPS5963781A (ja) | 発光構体 | |
JPS5681994A (en) | Field effect type semiconductor laser and manufacture thereof | |
DE3751782D1 (de) | Halbleiterstrukturen und deren Herstellungsverfahren | |
EP0187718B1 (en) | A distributed feedback semiconductor laser device | |
Kishino et al. | Fabrication and lasing properties of mesa substrate buried heterostructure GaInAsP/InP lasers at 1.3 µm wavelength | |
JPS57184277A (en) | Manufacture of semiconductor light emission device | |
JPS5673487A (en) | Semiconductor laser and its manufacture | |
EP0192451A2 (en) | A semiconductor laser device | |
JPS55121693A (en) | Manufacture of band-like semiconductor laser by selective melt-back process | |
JPH02228087A (ja) | 半導体レーザ素子 | |
JPS57162382A (en) | Semiconductor laser | |
JPS5451491A (en) | Semiconductor laser | |
JPS6449292A (en) | Semiconductor light-emitting device | |
JPS5596694A (en) | Semiconductor laser device and method of fabricating the same | |
JPS54138386A (en) | Semiconductor laser device of current narrow type | |
JPS5696888A (en) | Semiconductor light emitting device | |
JPS5580388A (en) | Semiconductor light emitting device | |
JPS57192094A (en) | Semiconductor laser device | |
JPS6412592A (en) | Semiconductor laser device | |
Koren et al. | Three-channel buried-crescent InGaAsP laser with 1.51 μm wavelength on semi-insulating InP | |
JPS641074B2 (enrdf_load_stackoverflow) | ||
JPS5580386A (en) | Manufacture of semiconductor light emitting device |