JPS57183091A - Manufacture of optical integrated circuit - Google Patents
Manufacture of optical integrated circuitInfo
- Publication number
- JPS57183091A JPS57183091A JP6815981A JP6815981A JPS57183091A JP S57183091 A JPS57183091 A JP S57183091A JP 6815981 A JP6815981 A JP 6815981A JP 6815981 A JP6815981 A JP 6815981A JP S57183091 A JPS57183091 A JP S57183091A
- Authority
- JP
- Japan
- Prior art keywords
- mesastripe
- substrate
- integrated circuit
- optical integrated
- waveguide path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- 239000007791 liquid phase Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/106—Comprising an active region having a varying composition or cross-section in a specific direction varying thickness along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/1064—Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6815981A JPS57183091A (en) | 1981-05-08 | 1981-05-08 | Manufacture of optical integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6815981A JPS57183091A (en) | 1981-05-08 | 1981-05-08 | Manufacture of optical integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57183091A true JPS57183091A (en) | 1982-11-11 |
JPS6237905B2 JPS6237905B2 (enrdf_load_stackoverflow) | 1987-08-14 |
Family
ID=13365692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6815981A Granted JPS57183091A (en) | 1981-05-08 | 1981-05-08 | Manufacture of optical integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57183091A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58114476A (ja) * | 1981-12-28 | 1983-07-07 | Kokusai Denshin Denwa Co Ltd <Kdd> | 半導体レ−ザ |
JPS59210682A (ja) * | 1983-05-16 | 1984-11-29 | Oki Electric Ind Co Ltd | 半導体レ−ザの製造方法 |
JPS61100990A (ja) * | 1984-10-22 | 1986-05-19 | Mitsubishi Electric Corp | 半導体レ−ザ装置 |
US4999316A (en) * | 1988-03-23 | 1991-03-12 | Massachusetts Institute Of Technology | Method for forming tapered laser or waveguide optoelectronic structures |
EP0617471A3 (en) * | 1993-03-25 | 1998-06-17 | Nippon Telegraph And Telephone Corporation | Optical functional devices, integrated optical devices, and methods for producing such devices |
EP0908959A3 (en) * | 1997-10-07 | 2000-05-24 | Sarnoff Corporation | Semiconductor diode |
-
1981
- 1981-05-08 JP JP6815981A patent/JPS57183091A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58114476A (ja) * | 1981-12-28 | 1983-07-07 | Kokusai Denshin Denwa Co Ltd <Kdd> | 半導体レ−ザ |
JPS59210682A (ja) * | 1983-05-16 | 1984-11-29 | Oki Electric Ind Co Ltd | 半導体レ−ザの製造方法 |
JPS61100990A (ja) * | 1984-10-22 | 1986-05-19 | Mitsubishi Electric Corp | 半導体レ−ザ装置 |
US4999316A (en) * | 1988-03-23 | 1991-03-12 | Massachusetts Institute Of Technology | Method for forming tapered laser or waveguide optoelectronic structures |
EP0617471A3 (en) * | 1993-03-25 | 1998-06-17 | Nippon Telegraph And Telephone Corporation | Optical functional devices, integrated optical devices, and methods for producing such devices |
EP0908959A3 (en) * | 1997-10-07 | 2000-05-24 | Sarnoff Corporation | Semiconductor diode |
Also Published As
Publication number | Publication date |
---|---|
JPS6237905B2 (enrdf_load_stackoverflow) | 1987-08-14 |
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