JPS57179732A - Apparatus for analysis of plating liquid - Google Patents

Apparatus for analysis of plating liquid

Info

Publication number
JPS57179732A
JPS57179732A JP6586381A JP6586381A JPS57179732A JP S57179732 A JPS57179732 A JP S57179732A JP 6586381 A JP6586381 A JP 6586381A JP 6586381 A JP6586381 A JP 6586381A JP S57179732 A JPS57179732 A JP S57179732A
Authority
JP
Japan
Prior art keywords
plating liquid
rays
ray
sample
exciting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6586381A
Other languages
Japanese (ja)
Other versions
JPH0228819B2 (en
Inventor
Masakatsu Fujino
Yoshiro Matsumoto
Seiji Ogawa
Hiroshi Ishijima
Takuro Teragaki
Minoru Handa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Nippon Steel Corp
Original Assignee
Seiko Instruments Inc
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc, Sumitomo Metal Industries Ltd filed Critical Seiko Instruments Inc
Priority to JP6586381A priority Critical patent/JPH0228819B2/en
Publication of JPS57179732A publication Critical patent/JPS57179732A/en
Publication of JPH0228819B2 publication Critical patent/JPH0228819B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To detect fluorescent X-rays from each element without the influence due to the presence of other elements, by making the primary X-rays for each element group such as Fe, Zn, Ni, etc. different from that for S by using two X- ray tubes. CONSTITUTION:The first sample holder 4 injected with Ni, Zn plating liquid to be analyzed and the second sample holder 5 enclosed with a standard sample, are connected to a guide groove 3 of a base stand 2 of a plating liquid analysis apparatus 1 and these are supported freely slidably, X rays from a X-ray generating apparatus 8 are irradiated to the plating liquid through a measuring room 7 and fluorescent X-rays from the sample are detected by a detector 9. The apparatus 8 is provided with an X-ray tube 10 for exciting S in the plating liquid and an X-ray tube 11 for exciting Fe, Ni, Zn in the plating liquid and the X-rays from either one of X-ray tubes are irradiated to the plating liquid. Simultaneous equations are solved from measured data obtained by irradiation of two X-rays by a CPU22 and content of the element removed of a matrix effect is found.
JP6586381A 1981-04-30 1981-04-30 METSUKIEKIBUNSEKISOCHI Expired - Lifetime JPH0228819B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6586381A JPH0228819B2 (en) 1981-04-30 1981-04-30 METSUKIEKIBUNSEKISOCHI

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6586381A JPH0228819B2 (en) 1981-04-30 1981-04-30 METSUKIEKIBUNSEKISOCHI

Publications (2)

Publication Number Publication Date
JPS57179732A true JPS57179732A (en) 1982-11-05
JPH0228819B2 JPH0228819B2 (en) 1990-06-26

Family

ID=13299261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6586381A Expired - Lifetime JPH0228819B2 (en) 1981-04-30 1981-04-30 METSUKIEKIBUNSEKISOCHI

Country Status (1)

Country Link
JP (1) JPH0228819B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60164239A (en) * 1984-02-06 1985-08-27 Seiko Instr & Electronics Ltd Plating liquid analyzing apparatus utilizing fluorescent x rays
JPS61207954A (en) * 1985-03-12 1986-09-16 Seiko Instr & Electronics Ltd Sample holder for plating liquid analyzing instrument
JPH03202760A (en) * 1989-10-19 1991-09-04 Sumitomo Electric Ind Ltd Total-reflection fluorescent x-ray analyzer
EP2095097A2 (en) * 2006-12-27 2009-09-02 Innov-X-Systems, Inc. Dual source xrf system
JP2015001482A (en) * 2013-06-17 2015-01-05 住友金属鉱山株式会社 Quantitative analysis method using x-ray fluorescence analyzer
WO2019031125A1 (en) * 2017-08-07 2019-02-14 上村工業株式会社 X-ray fluorescence analysis measurement method and x-ray fluorescence analysis measurement device
JP2019190934A (en) * 2018-04-23 2019-10-31 株式会社日立製作所 X-ray detector and x-ray measuring device using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003004673A (en) * 2001-06-15 2003-01-08 Sumitomo Metal Ind Ltd X-ray fluorescent liquid analyzer

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60164239A (en) * 1984-02-06 1985-08-27 Seiko Instr & Electronics Ltd Plating liquid analyzing apparatus utilizing fluorescent x rays
JPS61207954A (en) * 1985-03-12 1986-09-16 Seiko Instr & Electronics Ltd Sample holder for plating liquid analyzing instrument
JPH03202760A (en) * 1989-10-19 1991-09-04 Sumitomo Electric Ind Ltd Total-reflection fluorescent x-ray analyzer
EP2095097A2 (en) * 2006-12-27 2009-09-02 Innov-X-Systems, Inc. Dual source xrf system
EP2095097A4 (en) * 2006-12-27 2011-09-07 Innov X Systems Inc Dual source xrf system
JP2015001482A (en) * 2013-06-17 2015-01-05 住友金属鉱山株式会社 Quantitative analysis method using x-ray fluorescence analyzer
WO2019031125A1 (en) * 2017-08-07 2019-02-14 上村工業株式会社 X-ray fluorescence analysis measurement method and x-ray fluorescence analysis measurement device
KR20200035403A (en) * 2017-08-07 2020-04-03 우에무라 고교 가부시키가이샤 Fluorescence X-ray analysis measurement method and fluorescence X-ray analysis measurement device
JPWO2019031125A1 (en) * 2017-08-07 2020-07-02 上村工業株式会社 Measuring method of fluorescent X-ray analysis and measuring apparatus of fluorescent X-ray analysis
US11047814B2 (en) 2017-08-07 2021-06-29 C. Uyemura & Co., Ltd. X-ray fluorescence analysis measurement method and X-ray fluorescence analysis measurement device
TWI776923B (en) * 2017-08-07 2022-09-11 日商上村工業股份有限公司 Measuring method for fluorescence X-ray analysis and measuring device for fluorescence X-ray analysis
JP2019190934A (en) * 2018-04-23 2019-10-31 株式会社日立製作所 X-ray detector and x-ray measuring device using the same

Also Published As

Publication number Publication date
JPH0228819B2 (en) 1990-06-26

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