JPS61207954A - Sample holder for plating liquid analyzing instrument - Google Patents
Sample holder for plating liquid analyzing instrumentInfo
- Publication number
- JPS61207954A JPS61207954A JP4876085A JP4876085A JPS61207954A JP S61207954 A JPS61207954 A JP S61207954A JP 4876085 A JP4876085 A JP 4876085A JP 4876085 A JP4876085 A JP 4876085A JP S61207954 A JPS61207954 A JP S61207954A
- Authority
- JP
- Japan
- Prior art keywords
- sample holder
- holder
- plating
- plating liquid
- window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、メッキ鋼板の品質管理において重要な、メ
ッキ液の成分をＸ線で分析する几めの装置に用いるサン
プルホルダーに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a sample holder used in a precise device for analyzing the components of a plating solution using X-rays, which is important in the quality control of plated steel sheets.
この発明は、メッキ液分析装置のサンプルホルダーにお
いて、安定し几メッキ液サンプルの測定をする九めのも
のであり、サンプルホルダー後部下方よ、り入つ九メッ
キ液を上方より廃液させ、圧力変動を吸収する九めのエ
アーヌキパイプを有しこれを横方向に列べる事により多
種のサンプルを測定することを可能としｔものである。This invention is a sample holder of a plating solution analyzer that measures a stable plating solution sample, and drains the plating solution from above from the bottom rear of the sample holder to prevent pressure fluctuations. It has a ninth air pipe that absorbs water, and by arranging it horizontally, it is possible to measure a wide variety of samples.
従来、メッキ液の成分を分析する方法としては原子吸光
分析等が用いられてい友が、オンラインでの測定が不可
能なこと、測定スピードが遅いことなどより、リアルタ
イムでの多種メッキ液の同時測定が望まれてい几。Conventionally, atomic absorption spectrometry has been used as a method to analyze the components of plating solutions. is desired.
上記問題点を解決するｔめ、この発明はサンプルホルダ
ーへのメッキ液の入口をサンプルホルダー後面下方、出
口全後面上方としメッキ液の中にまじって入って来る測
定精度に影響を与えるエアーを、できるだけ早く外に出
す構造としｔ０又、メッキ液の圧力変動による測定マド
への影響を小さくし、フィルムの寿命をのばす几め、サ
ンプルホルダー出口にエアーヌキパイプを設け、サンプ
ルホルダー内の圧力上昇を押えている。又、エアーヌキ
パイプは、サンプルホルダー外部に設けである定めメッ
キ液の逆流はサンプルホルダー内に来る事はなく、安定
し比測定を行うことができる。In order to solve the above problems, this invention makes the inlet of the plating solution to the sample holder below the rear surface of the sample holder, and the outlet above the entire rear surface of the sample holder to prevent air from entering the plating solution and affecting measurement accuracy. In addition, in order to minimize the influence of pressure fluctuations of the plating solution on the measurement mud and extend the life of the film, an air drain pipe is installed at the sample holder outlet to prevent pressure rise inside the sample holder. I'm holding it down. In addition, since the air drying pipe is provided outside the sample holder, the backflow of the plating solution will not come into the sample holder, making it possible to perform stable ratio measurements.
又、サンプルホルダー側面からの液の出入をなくし友こ
とにより、サンプルホルダーｆ 列べて多連サンプルホ
ルダーを構成することができる。Furthermore, by eliminating the inflow and outflow of liquid from the side of the sample holder, a multiple sample holder can be constructed by arranging the sample holders f.
以下、この発明の実施例を図面に基いて説明する。第１
図、第２図、第３図は各々多連サンプルホルダーの正面
図、平面図、横断面図を示す。サンプルホルダー１は、
ホルダーペース２に０リング３を介して取付けられる。Embodiments of the present invention will be described below with reference to the drawings. 1st
2 and 3 show a front view, a plan view, and a cross-sectional view of the multiple sample holder, respectively. Sample holder 1 is
It is attached to the holder plate 2 via an O-ring 3.
ｔｅ、サンプルホルダー１及び、ホルダーペース２の内
径は各々１つの空間に区切られるようになっている。サ
ンプルホルダー１の前面にはマドを有するフタ４が０リ
ング５を介して取付られ、マドにはＸ線用フィルム６が
貼り付けられている。このマドにｘｆｉＩを照射するこ
とによりメッキ液の成分を測定する。前記ホルダーペー
ス２の後方には、ユニオン７．８が取り付けられ、通液
キューブ９エリ入って来るメッキ液は、サンプルホルダ
ー１内を上昇して廃！−？ユ−ブ１０より廃液される。The inner diameters of te, sample holder 1, and holder space 2 are each divided into one space. A lid 4 having a lid is attached to the front surface of the sample holder 1 via an O-ring 5, and an X-ray film 6 is attached to the lid. The components of the plating solution are measured by irradiating this plate with xfiI. A union 7.8 is attached to the rear of the holder plate 2, and the plating solution entering the liquid passage cube 9 rises inside the sample holder 1 and is discarded! −? The liquid is drained from the tube 10.
又、ユニオン８には、上方に向ってエアーヌキキューブ
１１が取り付けられており、メッキ液中のエアーをぬく
と同時にサンプルホルダー１内の圧力の上昇を押えてい
る。サンプルホルダー１．Ｘ線発生器１２、Ｘ線検出器
１５の配置は第１図のようになっており、サンプルホル
ダー１を横方向に移動してポジションを変えることによ
り、多種メッキ液の測定が可能となる。又、サンプルホ
ルダー１の保守の九め、軸１４を中心に回転することが
できる。Further, an air vacuum cube 11 is attached to the union 8 facing upward, which removes air from the plating solution and at the same time suppresses the increase in pressure within the sample holder 1. Sample holder 1. The X-ray generator 12 and X-ray detector 15 are arranged as shown in FIG. 1, and by moving the sample holder 1 laterally to change its position, it is possible to measure various types of plating solutions. Furthermore, the sample holder 1 can be rotated around the shaft 14 for maintenance purposes.
この発明は、以上説明し友様に、オンラインで多種のメ
ッキ液を分析するｔめのサンプルホルダーとして、安定
し比測定を行う几めに効果がある。As explained above, this invention is effective as a third sample holder for online analysis of various types of plating solutions in order to perform stable ratio measurements.
第１図は、この発明による多連サンプルホルダーの実施
例を示す図で、正面図である。
第２同は平面図である。第３図は横断面図である。
１・・・・・・サンプルホルダー
６・・・・・・Ｘ線用フィルム
１１・・・・・・エアーヌキキューブ
１２・・・・・・Ｘ線発生器
１５・・・・・・Ｘ線検出器
以 上
出願人 セイコー電子工業株式会社
代理人 弁理士 最 上 務
ケｔ４７ンアルホルデー正面図
第 １ 図FIG. 1 is a front view showing an embodiment of a multiple sample holder according to the present invention. The second figure is a plan view. FIG. 3 is a cross-sectional view. 1...Sample holder 6...X-ray film 11...Air cube 12...X-ray generator 15...X-ray Detector and above Applicant Seiko Electronic Industries Co., Ltd. Agent Patent Attorney Mogami Ket47 Alhold Front View Figure 1
Claims (2)
のサンプルホルダーにおいて、前面に測定のためのマド
を有し、後面にメッキ液が出入するパイプとサンプルホ
ルダー内の圧力を一定に保つためのエアーヌキパイプを
持つメッキ液分析装置用サンプルホルダー。(1) A sample holder for analyzing plating components using fluorescent X-rays, which has a measurement tube on the front, a pipe through which the plating solution enters and exits on the rear, and a constant pressure inside the sample holder. A sample holder for plating solution analyzers with an air pipe.
ッキ液を同時測定出来ることを特徴とした特許請求第（
１）項記載のメッキ分析装置用サンプルホルダー。(2) Patent claim No.
Sample holder for the plating analyzer described in section 1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4876085A JPS61207954A (en) | 1985-03-12 | 1985-03-12 | Sample holder for plating liquid analyzing instrument |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4876085A JPS61207954A (en) | 1985-03-12 | 1985-03-12 | Sample holder for plating liquid analyzing instrument |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61207954A true JPS61207954A (en) | 1986-09-16 |
Family
ID=12812235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4876085A Pending JPS61207954A (en) | 1985-03-12 | 1985-03-12 | Sample holder for plating liquid analyzing instrument |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61207954A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03197837A (en) * | 1989-12-27 | 1991-08-29 | Nikon Corp | Sample capsule for x-ray microscope |
| JP2003004673A (en) * | 2001-06-15 | 2003-01-08 | Sumitomo Metal Ind Ltd | X-ray fluorescent liquid analyzer |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5113773B1 (en) * | 1968-06-19 | 1976-05-04 | ||
| JPS57179732A (en) * | 1981-04-30 | 1982-11-05 | Sumitomo Metal Ind Ltd | Apparatus for analysis of plating liquid |
-
1985
- 1985-03-12 JP JP4876085A patent/JPS61207954A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5113773B1 (en) * | 1968-06-19 | 1976-05-04 | ||
| JPS57179732A (en) * | 1981-04-30 | 1982-11-05 | Sumitomo Metal Ind Ltd | Apparatus for analysis of plating liquid |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03197837A (en) * | 1989-12-27 | 1991-08-29 | Nikon Corp | Sample capsule for x-ray microscope |
| JP2003004673A (en) * | 2001-06-15 | 2003-01-08 | Sumitomo Metal Ind Ltd | X-ray fluorescent liquid analyzer |
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