JPS57177342A - Plasma treating apparatus of powder - Google Patents

Plasma treating apparatus of powder

Info

Publication number
JPS57177342A
JPS57177342A JP56060683A JP6068381A JPS57177342A JP S57177342 A JPS57177342 A JP S57177342A JP 56060683 A JP56060683 A JP 56060683A JP 6068381 A JP6068381 A JP 6068381A JP S57177342 A JPS57177342 A JP S57177342A
Authority
JP
Japan
Prior art keywords
powder
plasma
microwave
antenna
plasma treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56060683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0131933B2 (enrdf_load_stackoverflow
Inventor
Yoshimi Akai
Takashi Anami
Akira Taya
Masahiko Hirose
Tadashi Ido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56060683A priority Critical patent/JPS57177342A/ja
Publication of JPS57177342A publication Critical patent/JPS57177342A/ja
Publication of JPH0131933B2 publication Critical patent/JPH0131933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/126—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Hard Magnetic Materials (AREA)
  • Compounds Of Iron (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP56060683A 1981-04-23 1981-04-23 Plasma treating apparatus of powder Granted JPS57177342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56060683A JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56060683A JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Publications (2)

Publication Number Publication Date
JPS57177342A true JPS57177342A (en) 1982-11-01
JPH0131933B2 JPH0131933B2 (enrdf_load_stackoverflow) 1989-06-28

Family

ID=13149346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56060683A Granted JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Country Status (1)

Country Link
JP (1) JPS57177342A (enrdf_load_stackoverflow)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62238721A (ja) * 1986-04-10 1987-10-19 Seiko Epson Corp 射出成形サブストレ−ト
JPS62194433U (enrdf_load_stackoverflow) * 1986-05-30 1987-12-10
WO1998028117A1 (de) * 1996-12-20 1998-07-02 Iveco Gmbh & Co. Kg Anlage zur niederdruck-plasmabehandlung
JP2000186157A (ja) * 1998-12-22 2000-07-04 Hitachi Cable Ltd 粉体状架橋フッ素樹脂の製造方法
JP2000186155A (ja) * 1998-12-22 2000-07-04 Hitachi Cable Ltd 粉体状架橋フッ素樹脂の製造方法
WO2006028140A1 (ja) * 2004-09-07 2006-03-16 Nisshin Seifun Group Inc. 微粒子の製造方法および装置
JPWO2004112964A1 (ja) * 2003-06-20 2006-07-27 株式会社ホソカワ粉体技術研究所 粉体処理方法、粉体処理装置、及び、多孔質造粒物の製造方法
JP2007029859A (ja) * 2005-07-27 2007-02-08 Nisshin Seifun Group Inc 微粒子の製造方法および装置
JP2014504316A (ja) * 2010-12-08 2014-02-20 イノベイティブ・カーボン・リミテッド 粒状物質、それらを含む複合材料、それらの調製および使用
JP2014064980A (ja) * 2012-09-25 2014-04-17 Nippon Kagaku Kikai Seizo Kk 低エネルギー電磁波反応装置
JP2021041355A (ja) * 2019-09-12 2021-03-18 株式会社ニッシン プラズマ処理装置及びプラズマ処理方法
JP2022028496A (ja) * 2020-08-03 2022-02-16 株式会社ニッシン プラズマ処理装置
JP2022076958A (ja) * 2020-11-10 2022-05-20 有限会社ミネルバライトラボ 加熱式連続撹拌槽型反応器
JP2022527863A (ja) * 2019-04-05 2022-06-06 パイロウェーブ・インコーポレイテッド マイクロ波熱分解システムのための内部冷却されるインピーダンスチューナ
JP2022128353A (ja) * 2021-02-22 2022-09-01 エステック株式会社 プラズマ処理方法及び装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684462A (en) * 1979-12-10 1981-07-09 Shunpei Yamazaki Plasma nitriding method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684462A (en) * 1979-12-10 1981-07-09 Shunpei Yamazaki Plasma nitriding method

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62238721A (ja) * 1986-04-10 1987-10-19 Seiko Epson Corp 射出成形サブストレ−ト
JPS62194433U (enrdf_load_stackoverflow) * 1986-05-30 1987-12-10
WO1998028117A1 (de) * 1996-12-20 1998-07-02 Iveco Gmbh & Co. Kg Anlage zur niederdruck-plasmabehandlung
JP2000186157A (ja) * 1998-12-22 2000-07-04 Hitachi Cable Ltd 粉体状架橋フッ素樹脂の製造方法
JP2000186155A (ja) * 1998-12-22 2000-07-04 Hitachi Cable Ltd 粉体状架橋フッ素樹脂の製造方法
JP4580339B2 (ja) * 2003-06-20 2010-11-10 ホソカワミクロン株式会社 粉体処理方法、及び、粉体処理装置
JPWO2004112964A1 (ja) * 2003-06-20 2006-07-27 株式会社ホソカワ粉体技術研究所 粉体処理方法、粉体処理装置、及び、多孔質造粒物の製造方法
US7828999B2 (en) 2004-09-07 2010-11-09 Nisshin Seifun Group Inc. Process and apparatus for producing fine particles
WO2006028140A1 (ja) * 2004-09-07 2006-03-16 Nisshin Seifun Group Inc. 微粒子の製造方法および装置
JP2007029859A (ja) * 2005-07-27 2007-02-08 Nisshin Seifun Group Inc 微粒子の製造方法および装置
JP2014504316A (ja) * 2010-12-08 2014-02-20 イノベイティブ・カーボン・リミテッド 粒状物質、それらを含む複合材料、それらの調製および使用
US9764954B2 (en) 2010-12-08 2017-09-19 Haydale Graphene Industries Plc Particulate materials, composites comprising them, preparation and uses thereof
JP2014064980A (ja) * 2012-09-25 2014-04-17 Nippon Kagaku Kikai Seizo Kk 低エネルギー電磁波反応装置
JP2022527863A (ja) * 2019-04-05 2022-06-06 パイロウェーブ・インコーポレイテッド マイクロ波熱分解システムのための内部冷却されるインピーダンスチューナ
JP2021041355A (ja) * 2019-09-12 2021-03-18 株式会社ニッシン プラズマ処理装置及びプラズマ処理方法
JP2022028496A (ja) * 2020-08-03 2022-02-16 株式会社ニッシン プラズマ処理装置
JP2022076958A (ja) * 2020-11-10 2022-05-20 有限会社ミネルバライトラボ 加熱式連続撹拌槽型反応器
JP2022128353A (ja) * 2021-02-22 2022-09-01 エステック株式会社 プラズマ処理方法及び装置

Also Published As

Publication number Publication date
JPH0131933B2 (enrdf_load_stackoverflow) 1989-06-28

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