JPS57173969A - Solid state image pickup device - Google Patents
Solid state image pickup deviceInfo
- Publication number
- JPS57173969A JPS57173969A JP56059615A JP5961581A JPS57173969A JP S57173969 A JPS57173969 A JP S57173969A JP 56059615 A JP56059615 A JP 56059615A JP 5961581 A JP5961581 A JP 5961581A JP S57173969 A JPS57173969 A JP S57173969A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- amorphous
- insulator
- substrate
- type region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007787 solid Substances 0.000 title abstract 2
- 239000012212 insulator Substances 0.000 abstract 5
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
Abstract
PURPOSE:To reduce dark current by a method wherein a photodetector section constituted of an MIS type photodiode consisting of a metal layer, insulator layer, and amorphous Si layer is provided on a scanning circuit provided substrate. CONSTITUTION:A p<+> type region 11 is provided for the formation of a diode and, at the same time, a scanning circuit forming n<+> type region 12 (CCD) or a p<+> type region 13 (BBD) are formed on an n type semiconductor substrate 10. A gate electrode 14 is built on the substrate 10 across an insulator film 15 and an insulator layer 16 is laid on the electrode 14. Next, a metal layer 17 is provided electrically connected to the p<+> type region 11 on the substrate 10 and the metal layer 17 is covered by an insulator layer 18 and then by an amorphous Si layer 19, with the metal layer 17 and insulator 18 and amorphous Si layer 19 constituting an MIS type photodiode. A transparent electrode 20 is laid on the amorphous Si layer 19 for the completion of a solid state image pickup device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56059615A JPS57173969A (en) | 1981-04-20 | 1981-04-20 | Solid state image pickup device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56059615A JPS57173969A (en) | 1981-04-20 | 1981-04-20 | Solid state image pickup device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57173969A true JPS57173969A (en) | 1982-10-26 |
Family
ID=13118324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56059615A Pending JPS57173969A (en) | 1981-04-20 | 1981-04-20 | Solid state image pickup device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57173969A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016033978A (en) * | 2014-07-31 | 2016-03-10 | キヤノン株式会社 | Photoelectric conversion device and imaging system |
JP2016033972A (en) * | 2014-07-31 | 2016-03-10 | キヤノン株式会社 | Imaging apparatus and imaging system |
JP2016072389A (en) * | 2014-09-29 | 2016-05-09 | キヤノン株式会社 | Photoelectric converter, and imaging system |
JP2016072271A (en) * | 2014-09-26 | 2016-05-09 | キヤノン株式会社 | Imaging device |
-
1981
- 1981-04-20 JP JP56059615A patent/JPS57173969A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016033978A (en) * | 2014-07-31 | 2016-03-10 | キヤノン株式会社 | Photoelectric conversion device and imaging system |
JP2016033972A (en) * | 2014-07-31 | 2016-03-10 | キヤノン株式会社 | Imaging apparatus and imaging system |
US9991305B2 (en) | 2014-07-31 | 2018-06-05 | Canon Kabushiki Kaisha | Stacked type solid state imaging apparatus and imaging system |
US10511751B2 (en) | 2014-07-31 | 2019-12-17 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and image pickup system |
JP2016072271A (en) * | 2014-09-26 | 2016-05-09 | キヤノン株式会社 | Imaging device |
US10269849B2 (en) | 2014-09-26 | 2019-04-23 | Canon Kabushiki Kaisha | Imaging device including photoelectric conversion film for continuously covering electrodes having a distance between a counter electrode and a pixel electrode or an intermediate electrode is smaller than a distance between the counter electrode and an insulating member |
JP2016072389A (en) * | 2014-09-29 | 2016-05-09 | キヤノン株式会社 | Photoelectric converter, and imaging system |
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