JPS57172343A - Manufacture of photo-mask - Google Patents

Manufacture of photo-mask

Info

Publication number
JPS57172343A
JPS57172343A JP20506281A JP20506281A JPS57172343A JP S57172343 A JPS57172343 A JP S57172343A JP 20506281 A JP20506281 A JP 20506281A JP 20506281 A JP20506281 A JP 20506281A JP S57172343 A JPS57172343 A JP S57172343A
Authority
JP
Japan
Prior art keywords
photo
mask
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20506281A
Other languages
English (en)
Japanese (ja)
Inventor
Jinsumaisutaa Giruberuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of JPS57172343A publication Critical patent/JPS57172343A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP20506281A 1980-12-18 1981-12-18 Manufacture of photo-mask Pending JPS57172343A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH936680 1980-12-18

Publications (1)

Publication Number Publication Date
JPS57172343A true JPS57172343A (en) 1982-10-23

Family

ID=4351232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20506281A Pending JPS57172343A (en) 1980-12-18 1981-12-18 Manufacture of photo-mask

Country Status (5)

Country Link
JP (1) JPS57172343A (enrdf_load_stackoverflow)
DE (1) DE3147644A1 (enrdf_load_stackoverflow)
FR (1) FR2496914A1 (enrdf_load_stackoverflow)
GB (1) GB2090016B (enrdf_load_stackoverflow)
NL (1) NL8105495A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770947A (en) * 1987-01-02 1988-09-13 International Business Machines Corporation Multiple density mask and fabrication thereof
KR950002172B1 (ko) * 1991-06-13 1995-03-14 금성일렉트론주식회사 편광자를 사용한 편광노광장치 및 편광마스크 제조방법
RU2206115C1 (ru) * 2002-01-08 2003-06-10 Закрытое акционерное общество "Элма-Фотма" Фотошаблонная заготовка

Also Published As

Publication number Publication date
FR2496914B3 (enrdf_load_stackoverflow) 1983-11-10
FR2496914A1 (fr) 1982-06-25
NL8105495A (nl) 1982-07-16
GB2090016B (en) 1984-07-18
DE3147644A1 (de) 1982-11-18
GB2090016A (en) 1982-06-30

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