NL8105495A - Toepassing van een chroom, ijzer en zuurstof bevattende laag voor de vervaardiging van fotomaskers. - Google Patents
Toepassing van een chroom, ijzer en zuurstof bevattende laag voor de vervaardiging van fotomaskers. Download PDFInfo
- Publication number
- NL8105495A NL8105495A NL8105495A NL8105495A NL8105495A NL 8105495 A NL8105495 A NL 8105495A NL 8105495 A NL8105495 A NL 8105495A NL 8105495 A NL8105495 A NL 8105495A NL 8105495 A NL8105495 A NL 8105495A
- Authority
- NL
- Netherlands
- Prior art keywords
- iron
- layer
- chromium
- oxygen
- manufacture
- Prior art date
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 title claims description 30
- 229910052742 iron Inorganic materials 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 20
- 239000011651 chromium Substances 0.000 claims description 15
- 229910052804 chromium Inorganic materials 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 description 9
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 8
- 238000005530 etching Methods 0.000 description 6
- 230000000873 masking effect Effects 0.000 description 6
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 5
- 229910000423 chromium oxide Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH936680 | 1980-12-18 | ||
| CH936680 | 1980-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8105495A true NL8105495A (nl) | 1982-07-16 |
Family
ID=4351232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8105495A NL8105495A (nl) | 1980-12-18 | 1981-12-07 | Toepassing van een chroom, ijzer en zuurstof bevattende laag voor de vervaardiging van fotomaskers. |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS57172343A (enrdf_load_stackoverflow) |
| DE (1) | DE3147644A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2496914A1 (enrdf_load_stackoverflow) |
| GB (1) | GB2090016B (enrdf_load_stackoverflow) |
| NL (1) | NL8105495A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4770947A (en) * | 1987-01-02 | 1988-09-13 | International Business Machines Corporation | Multiple density mask and fabrication thereof |
| KR950002172B1 (ko) * | 1991-06-13 | 1995-03-14 | 금성일렉트론주식회사 | 편광자를 사용한 편광노광장치 및 편광마스크 제조방법 |
| RU2206115C1 (ru) * | 2002-01-08 | 2003-06-10 | Закрытое акционерное общество "Элма-Фотма" | Фотошаблонная заготовка |
-
1981
- 1981-12-02 DE DE19813147644 patent/DE3147644A1/de not_active Withdrawn
- 1981-12-07 NL NL8105495A patent/NL8105495A/nl not_active Application Discontinuation
- 1981-12-17 FR FR8123586A patent/FR2496914A1/fr active Granted
- 1981-12-17 GB GB8138155A patent/GB2090016B/en not_active Expired
- 1981-12-18 JP JP20506281A patent/JPS57172343A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2496914B3 (enrdf_load_stackoverflow) | 1983-11-10 |
| FR2496914A1 (fr) | 1982-06-25 |
| JPS57172343A (en) | 1982-10-23 |
| GB2090016B (en) | 1984-07-18 |
| DE3147644A1 (de) | 1982-11-18 |
| GB2090016A (en) | 1982-06-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1A | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BC | A request for examination has been filed | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |