GB2090016B - A photomask - Google Patents

A photomask

Info

Publication number
GB2090016B
GB2090016B GB8138155A GB8138155A GB2090016B GB 2090016 B GB2090016 B GB 2090016B GB 8138155 A GB8138155 A GB 8138155A GB 8138155 A GB8138155 A GB 8138155A GB 2090016 B GB2090016 B GB 2090016B
Authority
GB
United Kingdom
Prior art keywords
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8138155A
Other versions
GB2090016A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of GB2090016A publication Critical patent/GB2090016A/en
Application granted granted Critical
Publication of GB2090016B publication Critical patent/GB2090016B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB8138155A 1980-12-18 1981-12-17 A photomask Expired GB2090016B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH936680 1980-12-18

Publications (2)

Publication Number Publication Date
GB2090016A GB2090016A (en) 1982-06-30
GB2090016B true GB2090016B (en) 1984-07-18

Family

ID=4351232

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8138155A Expired GB2090016B (en) 1980-12-18 1981-12-17 A photomask

Country Status (5)

Country Link
JP (1) JPS57172343A (en)
DE (1) DE3147644A1 (en)
FR (1) FR2496914A1 (en)
GB (1) GB2090016B (en)
NL (1) NL8105495A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770947A (en) * 1987-01-02 1988-09-13 International Business Machines Corporation Multiple density mask and fabrication thereof
KR950002172B1 (en) * 1991-06-13 1995-03-14 금성일렉트론주식회사 Polarized light exposuring apparatus and mask manufacturing method using polarizer

Also Published As

Publication number Publication date
JPS57172343A (en) 1982-10-23
FR2496914A1 (en) 1982-06-25
FR2496914B3 (en) 1983-11-10
GB2090016A (en) 1982-06-30
NL8105495A (en) 1982-07-16
DE3147644A1 (en) 1982-11-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee