JPS57169090A - Sink working method by etching - Google Patents

Sink working method by etching

Info

Publication number
JPS57169090A
JPS57169090A JP5229381A JP5229381A JPS57169090A JP S57169090 A JPS57169090 A JP S57169090A JP 5229381 A JP5229381 A JP 5229381A JP 5229381 A JP5229381 A JP 5229381A JP S57169090 A JPS57169090 A JP S57169090A
Authority
JP
Japan
Prior art keywords
etching
sink
mask
groove
working pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5229381A
Other languages
Japanese (ja)
Inventor
Toshio Kojima
Kinichi Oomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Holdings Co Ltd
Citizen Watch Co Ltd
Original Assignee
Citizen Holdings Co Ltd
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Holdings Co Ltd, Citizen Watch Co Ltd filed Critical Citizen Holdings Co Ltd
Priority to JP5229381A priority Critical patent/JPS57169090A/en
Publication of JPS57169090A publication Critical patent/JPS57169090A/en
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To efficiently execute a plurality of sink workings, by making formation and removal of a resist mask correspond to etching of 2 times by use of 2 kinds of resists, and forming an escape groove of a sink bottom part.
CONSTITUTION: The first photoresist 3 is applied on a parts supply table 1, and the first etching mask 3a is formed on the outside of a working pattern 2' by means of photosensitive developing treatment. Subsequently, the second photoresist 4 of a different kind is applied on the whole surface, and the second etching mask 4a is formed at a constant interval from the working pattern 2' in the inside of the working pattern 2' by means of photosensitive development. Also, a groove 2a is formed by etching, the second resist mask 4a is removed by a solvent, and in this case, the first resist mask 3a is left. Subsequently, a sink 2 having the groove 2a on the circumference of the bottom part is formed by etching. After that, the first etching mask 3a is removed by other solvent, and the parts supply table 1 on which the desired sink 2 being formed is manufactured.
COPYRIGHT: (C)1982,JPO&Japio
JP5229381A 1981-04-07 1981-04-07 Sink working method by etching Pending JPS57169090A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5229381A JPS57169090A (en) 1981-04-07 1981-04-07 Sink working method by etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5229381A JPS57169090A (en) 1981-04-07 1981-04-07 Sink working method by etching

Publications (1)

Publication Number Publication Date
JPS57169090A true JPS57169090A (en) 1982-10-18

Family

ID=12910750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5229381A Pending JPS57169090A (en) 1981-04-07 1981-04-07 Sink working method by etching

Country Status (1)

Country Link
JP (1) JPS57169090A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2875872A1 (en) * 2013-11-25 2015-05-27 AKK GmbH Template for surface structures produced by etching

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2875872A1 (en) * 2013-11-25 2015-05-27 AKK GmbH Template for surface structures produced by etching
WO2015075231A1 (en) * 2013-11-25 2015-05-28 Akk Gmbh Template for etched surface structures
CN106488807A (en) * 2013-11-25 2017-03-08 Akk有限公司 Template for the surface structuration of etching technique
JP6126315B1 (en) * 2013-11-25 2017-05-10 アーカーカー ゲゼルシャフト ミット ベシュレンクテル ハフツングAKK GmbH Stencil for forming surface structure by etching
JP2017515967A (en) * 2013-11-25 2017-06-15 アーカーカー ゲゼルシャフト ミット ベシュレンクテル ハフツングAKK GmbH Stencil for forming surface structure by etching
US9962925B2 (en) 2013-11-25 2018-05-08 Akk Gmbh Stencil for forming surface structures by etching
CN106488807B (en) * 2013-11-25 2018-05-18 Akk有限公司 For the template of the surface structuration of etching technique

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