JPS57169090A - Sink working method by etching - Google Patents
Sink working method by etchingInfo
- Publication number
- JPS57169090A JPS57169090A JP5229381A JP5229381A JPS57169090A JP S57169090 A JPS57169090 A JP S57169090A JP 5229381 A JP5229381 A JP 5229381A JP 5229381 A JP5229381 A JP 5229381A JP S57169090 A JPS57169090 A JP S57169090A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- sink
- mask
- groove
- working pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To efficiently execute a plurality of sink workings, by making formation and removal of a resist mask correspond to etching of 2 times by use of 2 kinds of resists, and forming an escape groove of a sink bottom part.
CONSTITUTION: The first photoresist 3 is applied on a parts supply table 1, and the first etching mask 3a is formed on the outside of a working pattern 2' by means of photosensitive developing treatment. Subsequently, the second photoresist 4 of a different kind is applied on the whole surface, and the second etching mask 4a is formed at a constant interval from the working pattern 2' in the inside of the working pattern 2' by means of photosensitive development. Also, a groove 2a is formed by etching, the second resist mask 4a is removed by a solvent, and in this case, the first resist mask 3a is left. Subsequently, a sink 2 having the groove 2a on the circumference of the bottom part is formed by etching. After that, the first etching mask 3a is removed by other solvent, and the parts supply table 1 on which the desired sink 2 being formed is manufactured.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5229381A JPS57169090A (en) | 1981-04-07 | 1981-04-07 | Sink working method by etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5229381A JPS57169090A (en) | 1981-04-07 | 1981-04-07 | Sink working method by etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57169090A true JPS57169090A (en) | 1982-10-18 |
Family
ID=12910750
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5229381A Pending JPS57169090A (en) | 1981-04-07 | 1981-04-07 | Sink working method by etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57169090A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2875872A1 (en) * | 2013-11-25 | 2015-05-27 | AKK GmbH | Template for surface structures produced by etching |
-
1981
- 1981-04-07 JP JP5229381A patent/JPS57169090A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2875872A1 (en) * | 2013-11-25 | 2015-05-27 | AKK GmbH | Template for surface structures produced by etching |
WO2015075231A1 (en) * | 2013-11-25 | 2015-05-28 | Akk Gmbh | Template for etched surface structures |
CN106488807A (en) * | 2013-11-25 | 2017-03-08 | Akk有限公司 | Template for the surface structuration of etching technique |
JP6126315B1 (en) * | 2013-11-25 | 2017-05-10 | アーカーカー ゲゼルシャフト ミット ベシュレンクテル ハフツングAKK GmbH | Stencil for forming surface structure by etching |
JP2017515967A (en) * | 2013-11-25 | 2017-06-15 | アーカーカー ゲゼルシャフト ミット ベシュレンクテル ハフツングAKK GmbH | Stencil for forming surface structure by etching |
US9962925B2 (en) | 2013-11-25 | 2018-05-08 | Akk Gmbh | Stencil for forming surface structures by etching |
CN106488807B (en) * | 2013-11-25 | 2018-05-18 | Akk有限公司 | For the template of the surface structuration of etching technique |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0810475A3 (en) | Pattern exposing method using phase shift and mask used therefor | |
DE2961204D1 (en) | Process for manufacturing integrated implanted logic circuits with a hardened photoresist mask | |
JPS5569265A (en) | Pattern-forming method | |
JPS57169090A (en) | Sink working method by etching | |
JPS5339075A (en) | Step and repeat exposure method of masks | |
JPS57124733A (en) | Mask for forming image of pattern on photoresist layer | |
JPS5226171A (en) | Mask creation method | |
JPS51129190A (en) | Manufacturing method of semiconductor | |
JPS5699623A (en) | Preparation of embossed sheet | |
JPS52139374A (en) | Alignment pattern forming method for mask alignment | |
JPS56137632A (en) | Pattern forming | |
JPS52149978A (en) | Developing treatment method of photoresist film | |
JPS56165325A (en) | Formation of pattern | |
JPS5272175A (en) | Mask patterning of resist meterial | |
JPS533069A (en) | Photoetching mask | |
JPS5541728A (en) | Pattern formation by thick film paste | |
JPS5580323A (en) | Pattern forming method for photoresist-film | |
JPS5676531A (en) | Manufacture of semiconductor device | |
JPS5277671A (en) | Method and equipment of masking | |
JPS5373073A (en) | Treatment method for photo resist | |
JPS5251870A (en) | Electron bean exposure method | |
JPS5215266A (en) | Pattern printing unit | |
JPS51114931A (en) | Photoresist pattern formation method | |
JPS5347825A (en) | Photoresist exposure | |
JPS5381083A (en) | Focusing method of projection exposure apparatus |