JPS57169087A - Vacuum vapor-deposition device of crystal resonator - Google Patents
Vacuum vapor-deposition device of crystal resonatorInfo
- Publication number
- JPS57169087A JPS57169087A JP5405081A JP5405081A JPS57169087A JP S57169087 A JPS57169087 A JP S57169087A JP 5405081 A JP5405081 A JP 5405081A JP 5405081 A JP5405081 A JP 5405081A JP S57169087 A JPS57169087 A JP S57169087A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- shielding plate
- deposition
- evaporated
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title abstract 6
- 239000013078 crystal Substances 0.000 title abstract 2
- 230000008020 evaporation Effects 0.000 abstract 3
- 238000001704 evaporation Methods 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405081A JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405081A JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57169087A true JPS57169087A (en) | 1982-10-18 |
JPH021226B2 JPH021226B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-01-10 |
Family
ID=12959776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5405081A Granted JPS57169087A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-deposition device of crystal resonator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57169087A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179496A (ja) * | 1984-07-31 | 1986-08-12 | カシオ計算機株式会社 | 波形発生装置 |
JP2011210495A (ja) * | 2010-03-29 | 2011-10-20 | Seiko Instruments Inc | 端子付電気化学セルおよび製造方法 |
-
1981
- 1981-04-10 JP JP5405081A patent/JPS57169087A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179496A (ja) * | 1984-07-31 | 1986-08-12 | カシオ計算機株式会社 | 波形発生装置 |
JP2011210495A (ja) * | 2010-03-29 | 2011-10-20 | Seiko Instruments Inc | 端子付電気化学セルおよび製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH021226B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-01-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US2505370A (en) | Piezoelectric crystal unit | |
GB1209968A (en) | Rf sputtering method and system | |
DE59107781D1 (de) | Vorrichtung zum Beschichten von Substraten durch Kathodenzerstäubung | |
JPS576348A (en) | Nuclear magnetic resonator | |
JPS6456868A (en) | Formation of large-area thin compound film and its device | |
GB1339076A (en) | Method and apparatus for storing and reading out impulse resonance spectral data | |
JPS57169087A (en) | Vacuum vapor-deposition device of crystal resonator | |
US4818864A (en) | Method for eliminating undesirable charged particles from the measuring cell of an ICR spectrometer | |
GB1391842A (en) | Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel | |
US4833430A (en) | Coupled-dual resonator crystal | |
JPS57169084A (en) | Vacuum vapor-depositing device of crystal resonator | |
US5198090A (en) | Sputtering apparatus for producing thin films of material | |
JPS53119671A (en) | Ion implanting method | |
JPS57169086A (en) | Vacuum vapor-depositing device of crystal resonator | |
JPH0211761A (ja) | スパッタリング装置 | |
KR100358760B1 (ko) | 인시츄 물리기상 증착기 | |
JPS5399082A (en) | High frequency sputtering apparatus | |
US3030462A (en) | Solar timing mechanism | |
JPS5784428A (en) | Manufacture of liquid crystal display element | |
GB1447754A (en) | Apparatus for and process of metal coating | |
JPS5458690A (en) | Vapor deposition apparatus | |
JPS59197569A (ja) | スパツタリング装置の電極部構造 | |
KR910006920Y1 (ko) | 저항가열 진공증착장치 | |
JPS634067A (ja) | 蒸着用治具 | |
Miller et al. | A technique for investigating the properties of surfaces, thin films, and interfaces by means of a mechanical marginal oscillator |