JPS57166503A - Method for measuring film thickness - Google Patents
Method for measuring film thicknessInfo
- Publication number
- JPS57166503A JPS57166503A JP5272181A JP5272181A JPS57166503A JP S57166503 A JPS57166503 A JP S57166503A JP 5272181 A JP5272181 A JP 5272181A JP 5272181 A JP5272181 A JP 5272181A JP S57166503 A JPS57166503 A JP S57166503A
- Authority
- JP
- Japan
- Prior art keywords
- reflected
- film thickness
- laser beam
- intensity
- measured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
Abstract
PURPOSE:To eliminate the influence of variation in the intensity of laser beam during film thickness measurement which utilizes the laser beam, by separating the laser beam into two, reflecting one beam by the surface of a body to be measured, and using the ratio of the reflected beam and said other beam. CONSTITUTION:A laser beam 6 from a beam source 5 is split into a transmitted beam 8 and a reflected beam 9 through a half-mirror 7. The reflected beam 9 is reflected by a body 11 to be measured. The body to be measured is a one having a transparent film vapor-deposited on a transparent substrate, and the beam reflected on the surface of the transparent film and a beam reflected on a boudary surface between the transparent film and transparent substrate interferes to obtain an interference beam 12. From the intensity of the interference beam, film thickness is found. For this purpose, photodetectors 10 and 13 transduce the transmitted beam 8 and interference beam 12 into electric signals X and Y, and a comparator 14 finds a ratio Y/X, so that even if the laser beam 6 varies in intensity, the ratio is unchangeable, thus carrying out accurate measurement.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5272181A JPS57166503A (en) | 1981-04-07 | 1981-04-07 | Method for measuring film thickness |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5272181A JPS57166503A (en) | 1981-04-07 | 1981-04-07 | Method for measuring film thickness |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57166503A true JPS57166503A (en) | 1982-10-14 |
Family
ID=12922776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5272181A Pending JPS57166503A (en) | 1981-04-07 | 1981-04-07 | Method for measuring film thickness |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57166503A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5754297A (en) * | 1994-01-28 | 1998-05-19 | Applied Materials, Inc. | Method and apparatus for monitoring the deposition rate of films during physical vapor deposition |
-
1981
- 1981-04-07 JP JP5272181A patent/JPS57166503A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5754297A (en) * | 1994-01-28 | 1998-05-19 | Applied Materials, Inc. | Method and apparatus for monitoring the deposition rate of films during physical vapor deposition |
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