JPS57161727A - Manufacture of electrochromatic film - Google Patents
Manufacture of electrochromatic filmInfo
- Publication number
- JPS57161727A JPS57161727A JP56045594A JP4559481A JPS57161727A JP S57161727 A JPS57161727 A JP S57161727A JP 56045594 A JP56045594 A JP 56045594A JP 4559481 A JP4559481 A JP 4559481A JP S57161727 A JPS57161727 A JP S57161727A
- Authority
- JP
- Japan
- Prior art keywords
- film
- base plate
- gaseous
- electrode
- reactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/1514—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material
- G02F1/1523—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect characterised by the electrochromic material, e.g. by the electrodeposited material comprising inorganic material
- G02F1/1524—Transition metal compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To prevent peeling by increasing adhesive strength between a substrate and an WO3 film by fixing a tungusten plate to one electrode as a target, fitting the substrate to a counter electrode, and then performing DC or high-frequency sputtering under specific total pressure of the mixed gas of inert gas and gaseous O2. CONSTITUTION:On a lower electrode 26 in a reactor 7, a glass base plate 20 provided with a transparent conductive film is mounted with a heater 27 between, and an upper electrode 23 is provided with a back plate 24, where a W target 25 is fixed with a conductive adhesive. The reactor 7 is evacuated and gaseous Ar containing 1-20% gaseous O2 is introduced; and a high frequency is applied within the range of 5X10<-3>-1X10<-1> Torr mixed gas pressure to hole the base plate 20 at about 200 deg.C, and a shutter 10 is opened to form a WO3 film on the base plate 20. Further, DC discharge may be done with the base plate 20 fitted to an anode. Thus, the WO3 film is formed on the transparent conductive film on the base plate 20 to increase adhesive strength, thus obtaining a durable EDC device which is free of the peeling of the WO3 film.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56045594A JPS57161727A (en) | 1981-03-30 | 1981-03-30 | Manufacture of electrochromatic film |
US06/361,874 US4521081A (en) | 1981-03-30 | 1982-03-25 | Electrochromic display device |
US06/741,097 US4699471A (en) | 1981-03-30 | 1985-06-04 | Electrochromic display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56045594A JPS57161727A (en) | 1981-03-30 | 1981-03-30 | Manufacture of electrochromatic film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57161727A true JPS57161727A (en) | 1982-10-05 |
JPH0357457B2 JPH0357457B2 (en) | 1991-09-02 |
Family
ID=12723669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56045594A Granted JPS57161727A (en) | 1981-03-30 | 1981-03-30 | Manufacture of electrochromatic film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57161727A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01162764A (en) * | 1987-12-19 | 1989-06-27 | Fujitsu Ltd | Sputtering method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5140874A (en) * | 1974-10-04 | 1976-04-06 | Toppan Printing Co Ltd | |
JPS5541959A (en) * | 1978-09-18 | 1980-03-25 | Sanyo Shinku Kogyo Kk | Production of indium oxide transparent conductive film through sputtering |
-
1981
- 1981-03-30 JP JP56045594A patent/JPS57161727A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5140874A (en) * | 1974-10-04 | 1976-04-06 | Toppan Printing Co Ltd | |
JPS5541959A (en) * | 1978-09-18 | 1980-03-25 | Sanyo Shinku Kogyo Kk | Production of indium oxide transparent conductive film through sputtering |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01162764A (en) * | 1987-12-19 | 1989-06-27 | Fujitsu Ltd | Sputtering method |
Also Published As
Publication number | Publication date |
---|---|
JPH0357457B2 (en) | 1991-09-02 |
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