JPS57160131A - Washing cell - Google Patents

Washing cell

Info

Publication number
JPS57160131A
JPS57160131A JP4555181A JP4555181A JPS57160131A JP S57160131 A JPS57160131 A JP S57160131A JP 4555181 A JP4555181 A JP 4555181A JP 4555181 A JP4555181 A JP 4555181A JP S57160131 A JPS57160131 A JP S57160131A
Authority
JP
Japan
Prior art keywords
water
overflow
cell
rate
jetting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4555181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS645454B2 (enrdf_load_stackoverflow
Inventor
Morio Toyooka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4555181A priority Critical patent/JPS57160131A/ja
Publication of JPS57160131A publication Critical patent/JPS57160131A/ja
Publication of JPS645454B2 publication Critical patent/JPS645454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP4555181A 1981-03-30 1981-03-30 Washing cell Granted JPS57160131A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4555181A JPS57160131A (en) 1981-03-30 1981-03-30 Washing cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4555181A JPS57160131A (en) 1981-03-30 1981-03-30 Washing cell

Publications (2)

Publication Number Publication Date
JPS57160131A true JPS57160131A (en) 1982-10-02
JPS645454B2 JPS645454B2 (enrdf_load_stackoverflow) 1989-01-30

Family

ID=12722491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4555181A Granted JPS57160131A (en) 1981-03-30 1981-03-30 Washing cell

Country Status (1)

Country Link
JP (1) JPS57160131A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974887U (ja) * 1982-11-09 1984-05-21 ソニー株式会社 洗浄装置
JPS60163436A (ja) * 1984-02-06 1985-08-26 Seiichiro Sogo 半導体材料の洗浄乾燥方法
JPS61254280A (ja) * 1985-05-07 1986-11-12 オムロン株式会社 超音波洗浄装置
JPH0164044U (enrdf_load_stackoverflow) * 1987-10-16 1989-04-25
JPH09181034A (ja) * 1995-12-18 1997-07-11 Lg Semicon Co Ltd 半導体ウェーハ洗浄装置及び方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974887U (ja) * 1982-11-09 1984-05-21 ソニー株式会社 洗浄装置
JPS60163436A (ja) * 1984-02-06 1985-08-26 Seiichiro Sogo 半導体材料の洗浄乾燥方法
JPS61254280A (ja) * 1985-05-07 1986-11-12 オムロン株式会社 超音波洗浄装置
JPH0164044U (enrdf_load_stackoverflow) * 1987-10-16 1989-04-25
JPH09181034A (ja) * 1995-12-18 1997-07-11 Lg Semicon Co Ltd 半導体ウェーハ洗浄装置及び方法

Also Published As

Publication number Publication date
JPS645454B2 (enrdf_load_stackoverflow) 1989-01-30

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