JPS57158380A - Counter target type sputtering device - Google Patents

Counter target type sputtering device

Info

Publication number
JPS57158380A
JPS57158380A JP4323381A JP4323381A JPS57158380A JP S57158380 A JPS57158380 A JP S57158380A JP 4323381 A JP4323381 A JP 4323381A JP 4323381 A JP4323381 A JP 4323381A JP S57158380 A JPS57158380 A JP S57158380A
Authority
JP
Japan
Prior art keywords
targets
sputtering
magnetic fields
target
high speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4323381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320304B2 (enrdf_load_stackoverflow
Inventor
Masahiko Naoe
Yoichi Hoshi
Hiroyuki Koshimizu
Shunichi Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP4323381A priority Critical patent/JPS57158380A/ja
Publication of JPS57158380A publication Critical patent/JPS57158380A/ja
Publication of JPS6320304B2 publication Critical patent/JPS6320304B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP4323381A 1981-03-26 1981-03-26 Counter target type sputtering device Granted JPS57158380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4323381A JPS57158380A (en) 1981-03-26 1981-03-26 Counter target type sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4323381A JPS57158380A (en) 1981-03-26 1981-03-26 Counter target type sputtering device

Publications (2)

Publication Number Publication Date
JPS57158380A true JPS57158380A (en) 1982-09-30
JPS6320304B2 JPS6320304B2 (enrdf_load_stackoverflow) 1988-04-27

Family

ID=12658186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4323381A Granted JPS57158380A (en) 1981-03-26 1981-03-26 Counter target type sputtering device

Country Status (1)

Country Link
JP (1) JPS57158380A (enrdf_load_stackoverflow)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59142736A (ja) * 1983-02-03 1984-08-16 Konishiroku Photo Ind Co Ltd 連続磁性薄膜の製造方法
JPS59144032A (ja) * 1983-02-07 1984-08-17 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59148125A (ja) * 1983-02-15 1984-08-24 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157835A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157831A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157832A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157838A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157828A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS60101711A (ja) * 1983-11-05 1985-06-05 Konishiroku Photo Ind Co Ltd 磁気記録媒体の製造方法
JPS6288314A (ja) * 1985-10-15 1987-04-22 Osaka Shinku Kiki Seisakusho:Kk 鉄−銅系磁性薄膜の形成方法
JPH05102036A (ja) * 1991-10-11 1993-04-23 Applied Materials Japan Kk スパツタ装置
US6077406A (en) * 1998-04-17 2000-06-20 Kabushiki Kaisha Toshiba Sputtering system
EP1261042A1 (en) * 2001-05-14 2002-11-27 Kido, Junji Method for producing organic thin-film device by use of facing-targets-type sputtering apparatus
KR100686318B1 (ko) 2005-10-13 2007-02-26 성균관대학교산학협력단 전도성 탄소계 나노구조 코팅장치 및 방법
WO2007046243A1 (ja) * 2005-10-18 2007-04-26 Ulvac, Inc. スパッタリング装置及び成膜方法
US8911602B2 (en) 2006-07-14 2014-12-16 4D-S, Ltd Dual hexagonal shaped plasma source

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4563629B2 (ja) 2001-11-19 2010-10-13 株式会社エフ・ティ・エスコーポレーション 対向ターゲット式スパッタ装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743986A (en) * 1980-08-30 1982-03-12 Shimadzu Corp Film forming apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743986A (en) * 1980-08-30 1982-03-12 Shimadzu Corp Film forming apparatus

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59142736A (ja) * 1983-02-03 1984-08-16 Konishiroku Photo Ind Co Ltd 連続磁性薄膜の製造方法
JPS59144032A (ja) * 1983-02-07 1984-08-17 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59148125A (ja) * 1983-02-15 1984-08-24 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157835A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157831A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157832A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157838A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS59157828A (ja) * 1983-02-28 1984-09-07 Konishiroku Photo Ind Co Ltd 磁気記録媒体
JPS60101711A (ja) * 1983-11-05 1985-06-05 Konishiroku Photo Ind Co Ltd 磁気記録媒体の製造方法
JPS6288314A (ja) * 1985-10-15 1987-04-22 Osaka Shinku Kiki Seisakusho:Kk 鉄−銅系磁性薄膜の形成方法
JPH05102036A (ja) * 1991-10-11 1993-04-23 Applied Materials Japan Kk スパツタ装置
US6077406A (en) * 1998-04-17 2000-06-20 Kabushiki Kaisha Toshiba Sputtering system
EP1261042A1 (en) * 2001-05-14 2002-11-27 Kido, Junji Method for producing organic thin-film device by use of facing-targets-type sputtering apparatus
KR100686318B1 (ko) 2005-10-13 2007-02-26 성균관대학교산학협력단 전도성 탄소계 나노구조 코팅장치 및 방법
WO2007046243A1 (ja) * 2005-10-18 2007-04-26 Ulvac, Inc. スパッタリング装置及び成膜方法
KR100984965B1 (ko) 2005-10-18 2010-10-04 울박, 인크 스퍼터링 장치 및 성막 방법
US8585872B2 (en) 2005-10-18 2013-11-19 Ulvac, Inc. Sputtering apparatus and film-forming processes
US8911602B2 (en) 2006-07-14 2014-12-16 4D-S, Ltd Dual hexagonal shaped plasma source

Also Published As

Publication number Publication date
JPS6320304B2 (enrdf_load_stackoverflow) 1988-04-27

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