JPS57158373A - Method and device for controlling film thickness of vacuum deposited film - Google Patents
Method and device for controlling film thickness of vacuum deposited filmInfo
- Publication number
- JPS57158373A JPS57158373A JP56044457A JP4445781A JPS57158373A JP S57158373 A JPS57158373 A JP S57158373A JP 56044457 A JP56044457 A JP 56044457A JP 4445781 A JP4445781 A JP 4445781A JP S57158373 A JPS57158373 A JP S57158373A
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- monitors
- reflectivities
- substrates
- monitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56044457A JPS57158373A (en) | 1981-03-26 | 1981-03-26 | Method and device for controlling film thickness of vacuum deposited film |
US06/359,481 US4531838A (en) | 1981-03-26 | 1982-03-18 | Method and device for controlling the film thickness of evaporated film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56044457A JPS57158373A (en) | 1981-03-26 | 1981-03-26 | Method and device for controlling film thickness of vacuum deposited film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57158373A true JPS57158373A (en) | 1982-09-30 |
JPS6145702B2 JPS6145702B2 (ja) | 1986-10-09 |
Family
ID=12692012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56044457A Granted JPS57158373A (en) | 1981-03-26 | 1981-03-26 | Method and device for controlling film thickness of vacuum deposited film |
Country Status (2)
Country | Link |
---|---|
US (1) | US4531838A (ja) |
JP (1) | JPS57158373A (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3309101B2 (ja) * | 1992-08-31 | 2002-07-29 | 株式会社シンクロン | 薄膜の屈折率測定方法および装置 |
US5416594A (en) * | 1993-07-20 | 1995-05-16 | Tencor Instruments | Surface scanner with thin film gauge |
US6611378B1 (en) | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
KR100794672B1 (ko) | 2006-07-06 | 2008-01-14 | (주)인텍 | 진공 증착기 |
CN101538699B (zh) * | 2008-03-17 | 2012-06-20 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置及其所使用的镀膜伞架遮罩 |
CN101597747B (zh) * | 2008-06-05 | 2012-06-20 | 鸿富锦精密工业(深圳)有限公司 | 光学镀膜装置 |
JP6550101B2 (ja) * | 2017-07-13 | 2019-07-24 | Jfeテクノリサーチ株式会社 | 膜厚測定方法及び膜厚測定装置 |
CN110793942B (zh) * | 2019-10-12 | 2022-02-08 | 天津大学 | 基于彩色相机的二维材料形貌快速表征系统和方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3645623A (en) * | 1970-09-25 | 1972-02-29 | Raymond A Patten | Apparatus for monitoring film thickness by reflecting a light beam from the film surface |
US3737237A (en) * | 1971-11-18 | 1973-06-05 | Nasa | Monitoring deposition of films |
US3869211A (en) * | 1972-06-29 | 1975-03-04 | Canon Kk | Instrument for measuring thickness of thin film |
-
1981
- 1981-03-26 JP JP56044457A patent/JPS57158373A/ja active Granted
-
1982
- 1982-03-18 US US06/359,481 patent/US4531838A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6145702B2 (ja) | 1986-10-09 |
US4531838A (en) | 1985-07-30 |
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