JPS6439362A - Method and device for depositing metal oxide film on substrate - Google Patents

Method and device for depositing metal oxide film on substrate

Info

Publication number
JPS6439362A
JPS6439362A JP19480487A JP19480487A JPS6439362A JP S6439362 A JPS6439362 A JP S6439362A JP 19480487 A JP19480487 A JP 19480487A JP 19480487 A JP19480487 A JP 19480487A JP S6439362 A JPS6439362 A JP S6439362A
Authority
JP
Japan
Prior art keywords
value
reference value
spectral intensity
film
difference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19480487A
Other languages
Japanese (ja)
Other versions
JP2607091B2 (en
Inventor
Akio Tsumura
Suguru Yamamoto
Zenichi Ueda
Kazuaki Sasa
Masaharu Seki
Kazunori Kawamura
Hidehito Okano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP62194804A priority Critical patent/JP2607091B2/en
Publication of JPS6439362A publication Critical patent/JPS6439362A/en
Application granted granted Critical
Publication of JP2607091B2 publication Critical patent/JP2607091B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To stably deposit a metal oxide film on a substrate by changing the spectral intensity of plasma light in accordance with the difference between the measured value and reference value of the sheet resistivity of the film, using the obtained value as the reference value, and controlling the supply amt. of a sputtering gas from the difference between the reference value and the measured value of the spectral intensity. CONSTITUTION:When a film is deposited by sputtering on the traveling film substrate 2 on an electrode roll 3, the plasma light 17 is focused by a plasma light condensing lens 18, and dispersed by a spectroscope 19. The spectrum is measured by a light quantity detector 20, and the wavelength and light quantity are quantitatively inputted to a control part 22. Meanwhile, when the sheet resistivity value of the film is measured by a measuring device 25 and inputted to the control part 22, the spectral intensity of a specified wavelength is changed due to the difference between the input resistivity value and the reference value. The spectral intensity is used as the reference value, the reference value is compared with the measured value of the spectral intensity of a specified wavelength obtained from the plasma light, a sputtering gas supply device 23 is controlled based on the difference, and the opening and closing of the valves at a gaseous Ar inlet 12 and a gas inlet 13 are controlled.
JP62194804A 1987-08-04 1987-08-04 Method and apparatus for continuously depositing a metal oxide film on a long film substrate Expired - Lifetime JP2607091B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62194804A JP2607091B2 (en) 1987-08-04 1987-08-04 Method and apparatus for continuously depositing a metal oxide film on a long film substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62194804A JP2607091B2 (en) 1987-08-04 1987-08-04 Method and apparatus for continuously depositing a metal oxide film on a long film substrate

Publications (2)

Publication Number Publication Date
JPS6439362A true JPS6439362A (en) 1989-02-09
JP2607091B2 JP2607091B2 (en) 1997-05-07

Family

ID=16330535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62194804A Expired - Lifetime JP2607091B2 (en) 1987-08-04 1987-08-04 Method and apparatus for continuously depositing a metal oxide film on a long film substrate

Country Status (1)

Country Link
JP (1) JP2607091B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794045A (en) * 1993-09-27 1995-04-07 Sumitomo Bakelite Co Ltd Manufacture of transparent conductive film
JP2003201562A (en) * 2002-01-11 2003-07-18 Nippon Telegr & Teleph Corp <Ntt> Method for monitoring film deposition
JP2006342371A (en) * 2005-06-07 2006-12-21 Bridgestone Corp Electroconductive compound thin film, and method for depositing the same
JP2009144192A (en) * 2007-12-13 2009-07-02 Fujifilm Corp Reactive sputtering apparatus, and reactive sputtering method
CN115161604A (en) * 2022-07-05 2022-10-11 东莞市龙铮真空设备有限公司 Vacuum nano coating deposited on surface of wallpaper

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57161063A (en) * 1981-03-31 1982-10-04 Nippon Sheet Glass Co Ltd Method and device for sticking metallic oxide film on substrate
JPS58141381A (en) * 1982-02-15 1983-08-22 Hitachi Ltd Thin film forming device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57161063A (en) * 1981-03-31 1982-10-04 Nippon Sheet Glass Co Ltd Method and device for sticking metallic oxide film on substrate
JPS58141381A (en) * 1982-02-15 1983-08-22 Hitachi Ltd Thin film forming device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794045A (en) * 1993-09-27 1995-04-07 Sumitomo Bakelite Co Ltd Manufacture of transparent conductive film
JP2003201562A (en) * 2002-01-11 2003-07-18 Nippon Telegr & Teleph Corp <Ntt> Method for monitoring film deposition
JP2006342371A (en) * 2005-06-07 2006-12-21 Bridgestone Corp Electroconductive compound thin film, and method for depositing the same
JP2009144192A (en) * 2007-12-13 2009-07-02 Fujifilm Corp Reactive sputtering apparatus, and reactive sputtering method
CN115161604A (en) * 2022-07-05 2022-10-11 东莞市龙铮真空设备有限公司 Vacuum nano coating deposited on surface of wallpaper

Also Published As

Publication number Publication date
JP2607091B2 (en) 1997-05-07

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