JPS57155723A - Epitaxial growth method - Google Patents
Epitaxial growth methodInfo
- Publication number
- JPS57155723A JPS57155723A JP4150881A JP4150881A JPS57155723A JP S57155723 A JPS57155723 A JP S57155723A JP 4150881 A JP4150881 A JP 4150881A JP 4150881 A JP4150881 A JP 4150881A JP S57155723 A JPS57155723 A JP S57155723A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- gas
- grown
- gaas
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To permit introduction of a growth gas to a reaction system by a method wherein the growth gas is sealed to a tank arranged adjacent the reaction system and the pressure of the tank is set higher than that in the reaction system.
CONSTITUTION: A reaction chamber 10 is placed in a pressure reduced condition by a vacuum suction pump 25 under a condition wherein AsH3+H2 is supplied from a third gas supply system 15. At the same time, GaAs growth gas is sealed at a predetermined pressure to tank T1, T2 in a first gas supply system 13 and GaAl growth gas is sealed to tank T3, T4 in a second gas supply system 14, further a substrate A is heated, thereafter a valve V2 is opened, the GaAs is grown on the surface of the substrate A with the gas contained in the tank T1, and successively GaAs is grown on the substrate surface by using the gas contained in the tank T2. Further, GaAlAs is grown as well by using the gas in the tank T3. During this processing, GaAs is grown on the surface of te substrate B in a similar manner.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4150881A JPS57155723A (en) | 1981-03-20 | 1981-03-20 | Epitaxial growth method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4150881A JPS57155723A (en) | 1981-03-20 | 1981-03-20 | Epitaxial growth method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57155723A true JPS57155723A (en) | 1982-09-25 |
JPH0445973B2 JPH0445973B2 (en) | 1992-07-28 |
Family
ID=12610298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4150881A Granted JPS57155723A (en) | 1981-03-20 | 1981-03-20 | Epitaxial growth method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57155723A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0375682U (en) * | 1989-11-24 | 1991-07-30 | ||
JPH04137523A (en) * | 1990-09-27 | 1992-05-12 | Shimadzu Corp | Function diagnosing device for thin film forming device |
JP2010087231A (en) * | 2008-09-30 | 2010-04-15 | Tokyo Electron Ltd | Vacuum processing device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5136587A (en) * | 1974-04-06 | 1976-03-27 | Int Standard Electric Corp | |
JPS54124897A (en) * | 1978-03-07 | 1979-09-28 | Thomson Csf | Method and apparatus for forming epitaxial layer of indium phosphide in gas phase |
JPS5586112A (en) * | 1978-12-25 | 1980-06-28 | Toshiba Corp | Vapor phase growth method for 3-5 group compound semiconductor |
-
1981
- 1981-03-20 JP JP4150881A patent/JPS57155723A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5136587A (en) * | 1974-04-06 | 1976-03-27 | Int Standard Electric Corp | |
JPS54124897A (en) * | 1978-03-07 | 1979-09-28 | Thomson Csf | Method and apparatus for forming epitaxial layer of indium phosphide in gas phase |
JPS5586112A (en) * | 1978-12-25 | 1980-06-28 | Toshiba Corp | Vapor phase growth method for 3-5 group compound semiconductor |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0375682U (en) * | 1989-11-24 | 1991-07-30 | ||
JPH04137523A (en) * | 1990-09-27 | 1992-05-12 | Shimadzu Corp | Function diagnosing device for thin film forming device |
JP2010087231A (en) * | 2008-09-30 | 2010-04-15 | Tokyo Electron Ltd | Vacuum processing device |
Also Published As
Publication number | Publication date |
---|---|
JPH0445973B2 (en) | 1992-07-28 |
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