JPS57155369A - High vacuum ion plating method and apparatus - Google Patents

High vacuum ion plating method and apparatus

Info

Publication number
JPS57155369A
JPS57155369A JP4071981A JP4071981A JPS57155369A JP S57155369 A JPS57155369 A JP S57155369A JP 4071981 A JP4071981 A JP 4071981A JP 4071981 A JP4071981 A JP 4071981A JP S57155369 A JPS57155369 A JP S57155369A
Authority
JP
Japan
Prior art keywords
steam stream
converged
magnetic material
source
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4071981A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0152472B2 (enrdf_load_stackoverflow
Inventor
Makoto Nagao
Akira Nahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4071981A priority Critical patent/JPS57155369A/ja
Priority to DE19823204337 priority patent/DE3204337A1/de
Publication of JPS57155369A publication Critical patent/JPS57155369A/ja
Publication of JPH0152472B2 publication Critical patent/JPH0152472B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP4071981A 1981-02-10 1981-03-20 High vacuum ion plating method and apparatus Granted JPS57155369A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4071981A JPS57155369A (en) 1981-03-20 1981-03-20 High vacuum ion plating method and apparatus
DE19823204337 DE3204337A1 (de) 1981-02-10 1982-02-09 Verfahren und vorrichtung zum bilden eines duennen films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4071981A JPS57155369A (en) 1981-03-20 1981-03-20 High vacuum ion plating method and apparatus

Publications (2)

Publication Number Publication Date
JPS57155369A true JPS57155369A (en) 1982-09-25
JPH0152472B2 JPH0152472B2 (enrdf_load_stackoverflow) 1989-11-08

Family

ID=12588399

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4071981A Granted JPS57155369A (en) 1981-02-10 1981-03-20 High vacuum ion plating method and apparatus

Country Status (1)

Country Link
JP (1) JPS57155369A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021379A (ja) * 1983-07-18 1985-02-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
US4648347A (en) * 1984-05-30 1987-03-10 Leybold-Heraeus Gmbh Vacuum depositing apparatus
JPS63204513A (ja) * 1987-02-20 1988-08-24 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPS63259835A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPS63259833A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPS63259832A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPH01285023A (ja) * 1988-05-10 1989-11-16 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPH0256730A (ja) * 1988-08-19 1990-02-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021379A (ja) * 1983-07-18 1985-02-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
US4648347A (en) * 1984-05-30 1987-03-10 Leybold-Heraeus Gmbh Vacuum depositing apparatus
JPS63204513A (ja) * 1987-02-20 1988-08-24 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPS63259835A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPS63259833A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPS63259832A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPH01285023A (ja) * 1988-05-10 1989-11-16 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
JPH0256730A (ja) * 1988-08-19 1990-02-26 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法

Also Published As

Publication number Publication date
JPH0152472B2 (enrdf_load_stackoverflow) 1989-11-08

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