JPS57148347A - Measurement of connection accuracy for electron beam exposure - Google Patents

Measurement of connection accuracy for electron beam exposure

Info

Publication number
JPS57148347A
JPS57148347A JP56033676A JP3367681A JPS57148347A JP S57148347 A JPS57148347 A JP S57148347A JP 56033676 A JP56033676 A JP 56033676A JP 3367681 A JP3367681 A JP 3367681A JP S57148347 A JPS57148347 A JP S57148347A
Authority
JP
Japan
Prior art keywords
graduations
vernier
main
boundary
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56033676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6214089B2 (enExample
Inventor
Hitoshi Takemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP56033676A priority Critical patent/JPS57148347A/ja
Publication of JPS57148347A publication Critical patent/JPS57148347A/ja
Publication of JPS6214089B2 publication Critical patent/JPS6214089B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56033676A 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure Granted JPS57148347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56033676A JPS57148347A (en) 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56033676A JPS57148347A (en) 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS57148347A true JPS57148347A (en) 1982-09-13
JPS6214089B2 JPS6214089B2 (enExample) 1987-03-31

Family

ID=12393049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56033676A Granted JPS57148347A (en) 1981-03-09 1981-03-09 Measurement of connection accuracy for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS57148347A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834731U (ja) * 1981-08-28 1983-03-07 三洋電機株式会社 電子ビ−ム露光用マスク
JPS604216A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 電子ビ−ム露光方法
JPS62263633A (ja) * 1986-05-09 1987-11-16 Mitsubishi Electric Corp パタ−ン描画方法
JPH025407A (ja) * 1988-06-22 1990-01-10 Nec Corp 電子線描画用接続精度測定方法
KR100242503B1 (ko) * 1995-12-18 2000-03-02 가네꼬 히사시 반도체 기판에 형성된 패턴의 오정렬 검출 마크

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01118074U (enExample) * 1988-02-02 1989-08-09

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5834731U (ja) * 1981-08-28 1983-03-07 三洋電機株式会社 電子ビ−ム露光用マスク
JPS604216A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 電子ビ−ム露光方法
JPS62263633A (ja) * 1986-05-09 1987-11-16 Mitsubishi Electric Corp パタ−ン描画方法
JPH025407A (ja) * 1988-06-22 1990-01-10 Nec Corp 電子線描画用接続精度測定方法
KR100242503B1 (ko) * 1995-12-18 2000-03-02 가네꼬 히사시 반도체 기판에 형성된 패턴의 오정렬 검출 마크

Also Published As

Publication number Publication date
JPS6214089B2 (enExample) 1987-03-31

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