JPS57147273A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS57147273A JPS57147273A JP56032091A JP3209181A JPS57147273A JP S57147273 A JPS57147273 A JP S57147273A JP 56032091 A JP56032091 A JP 56032091A JP 3209181 A JP3209181 A JP 3209181A JP S57147273 A JPS57147273 A JP S57147273A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- sio2
- cvd method
- base region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56032091A JPS57147273A (en) | 1981-03-06 | 1981-03-06 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56032091A JPS57147273A (en) | 1981-03-06 | 1981-03-06 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57147273A true JPS57147273A (en) | 1982-09-11 |
| JPS6410106B2 JPS6410106B2 (enrdf_load_stackoverflow) | 1989-02-21 |
Family
ID=12349203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56032091A Granted JPS57147273A (en) | 1981-03-06 | 1981-03-06 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57147273A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6351079A (ja) * | 1986-08-20 | 1988-03-04 | 松下電器産業株式会社 | 高周波加熱装置 |
-
1981
- 1981-03-06 JP JP56032091A patent/JPS57147273A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6351079A (ja) * | 1986-08-20 | 1988-03-04 | 松下電器産業株式会社 | 高周波加熱装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6410106B2 (enrdf_load_stackoverflow) | 1989-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5430777A (en) | Manufacture of semiconductor device | |
| JPS5555559A (en) | Method of fabricating semiconductor device | |
| JPS57147273A (en) | Manufacture of semiconductor device | |
| JPS577939A (en) | Manufacture of semiconductor device | |
| JPS5737830A (en) | Manufacture of semiconductor device | |
| JPS5515231A (en) | Manufacturing method of semiconductor device | |
| JPS5244795A (en) | Formation of silicon nitride film | |
| JPS5633840A (en) | Manufacture of semiconductor device | |
| JPS5650573A (en) | Mis tunnel diode type mosfet | |
| JPS51147250A (en) | Treatment method of semiconductor substrate | |
| JPS5740956A (en) | Semiconductor device | |
| JPS5546577A (en) | Method of fabricating semicondcutor device | |
| JPS6474754A (en) | Semiconductor device | |
| JPS5513951A (en) | Manufacturing method of semiconductor device | |
| JPS5754365A (en) | Manufacture of transistor | |
| JPS57206071A (en) | Semiconductor device and manufacture thereof | |
| JPS5742146A (en) | Manufacture of semiconductor device | |
| JPS5759322A (en) | Manufacture of semiconductor device | |
| JPS5671943A (en) | Oxide film coating of compound semiconductor device | |
| JPS647566A (en) | Manufacture of thin film transistor | |
| JPS5662370A (en) | Manufacturing of semiconductor device | |
| JPS5749232A (en) | Manufacture of semiconductor device | |
| JPS648058A (en) | Thermal head and method of manufacture | |
| JPS5753967A (ja) | Moribudendenkyokuhaisensonokeiseihoho | |
| JPS5315775A (en) | Production of mos type semiconductor device |