JPS57139925A - Positioning device - Google Patents

Positioning device

Info

Publication number
JPS57139925A
JPS57139925A JP56025291A JP2529181A JPS57139925A JP S57139925 A JPS57139925 A JP S57139925A JP 56025291 A JP56025291 A JP 56025291A JP 2529181 A JP2529181 A JP 2529181A JP S57139925 A JPS57139925 A JP S57139925A
Authority
JP
Japan
Prior art keywords
patterns
positioning
superposed
wafer
articles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56025291A
Other languages
Japanese (ja)
Other versions
JPS6210012B2 (en
Inventor
Akira Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56025291A priority Critical patent/JPS57139925A/en
Publication of JPS57139925A publication Critical patent/JPS57139925A/en
Publication of JPS6210012B2 publication Critical patent/JPS6210012B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a positioning device adapted to roughly position between articles with a simple structure by forming a specific diffraction grating and opaque pattern on the first and second articles. CONSTITUTION:For example, three diffraction grating patterns 11 are formed on the perpheral edge of a wafer 1, positioning patterns 41 are formed at three positions at the perpheral edge of a mask 4, and are positioned so that, when they are superposed, the opaque pattern 41a of the patterns 11, 41 are superposed to each other. A laser light 6a is reciprocatingly scanned on the patterns 11, 41, the parameters of the waveforms of the signals received by photoreceptors 20, 21 are compared by an arithmetic circuit 23, thereby obtaining the difference, and a movable table 3 is moved so that the waveforms become equal by a controller 24, thereby positioning the wafer 1 with the mask 4 at their relative position.
JP56025291A 1981-02-23 1981-02-23 Positioning device Granted JPS57139925A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56025291A JPS57139925A (en) 1981-02-23 1981-02-23 Positioning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56025291A JPS57139925A (en) 1981-02-23 1981-02-23 Positioning device

Publications (2)

Publication Number Publication Date
JPS57139925A true JPS57139925A (en) 1982-08-30
JPS6210012B2 JPS6210012B2 (en) 1987-03-04

Family

ID=12161907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56025291A Granted JPS57139925A (en) 1981-02-23 1981-02-23 Positioning device

Country Status (1)

Country Link
JP (1) JPS57139925A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173835A (en) * 1984-01-30 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> Controlling method of gap by diffraction grating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173835A (en) * 1984-01-30 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> Controlling method of gap by diffraction grating
JPH0263288B2 (en) * 1984-01-30 1990-12-27 Nippon Telegraph & Telephone

Also Published As

Publication number Publication date
JPS6210012B2 (en) 1987-03-04

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