JPS57134970A - Manufacture of thin film transistor - Google Patents
Manufacture of thin film transistorInfo
- Publication number
- JPS57134970A JPS57134970A JP56019891A JP1989181A JPS57134970A JP S57134970 A JPS57134970 A JP S57134970A JP 56019891 A JP56019891 A JP 56019891A JP 1989181 A JP1989181 A JP 1989181A JP S57134970 A JPS57134970 A JP S57134970A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- gate
- region
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56019891A JPS57134970A (en) | 1981-02-13 | 1981-02-13 | Manufacture of thin film transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56019891A JPS57134970A (en) | 1981-02-13 | 1981-02-13 | Manufacture of thin film transistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57134970A true JPS57134970A (en) | 1982-08-20 |
| JPH0348670B2 JPH0348670B2 (enExample) | 1991-07-25 |
Family
ID=12011812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56019891A Granted JPS57134970A (en) | 1981-02-13 | 1981-02-13 | Manufacture of thin film transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57134970A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60100468A (ja) * | 1983-11-07 | 1985-06-04 | Hitachi Ltd | プラズマ陽極酸化装置 |
| JPH05243577A (ja) * | 1992-02-26 | 1993-09-21 | Seiko Epson Corp | 薄膜トランジスタの製造方法 |
| FR2752338A1 (fr) * | 1996-06-28 | 1998-02-13 | Lg Electronics Inc | Transistor en couche mince a siliciure |
-
1981
- 1981-02-13 JP JP56019891A patent/JPS57134970A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60100468A (ja) * | 1983-11-07 | 1985-06-04 | Hitachi Ltd | プラズマ陽極酸化装置 |
| JPH05243577A (ja) * | 1992-02-26 | 1993-09-21 | Seiko Epson Corp | 薄膜トランジスタの製造方法 |
| FR2752338A1 (fr) * | 1996-06-28 | 1998-02-13 | Lg Electronics Inc | Transistor en couche mince a siliciure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0348670B2 (enExample) | 1991-07-25 |
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