JPS57131227A - Photopolymer and its production - Google Patents

Photopolymer and its production

Info

Publication number
JPS57131227A
JPS57131227A JP1684081A JP1684081A JPS57131227A JP S57131227 A JPS57131227 A JP S57131227A JP 1684081 A JP1684081 A JP 1684081A JP 1684081 A JP1684081 A JP 1684081A JP S57131227 A JPS57131227 A JP S57131227A
Authority
JP
Japan
Prior art keywords
group
formula
processability
polar solvent
tetracarboxylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1684081A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0153291B2 (enrdf_load_stackoverflow
Inventor
Shigeo Sugihara
Akira Iwazawa
Haruyori Tanaka
Katsuhide Onose
Masao Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1684081A priority Critical patent/JPS57131227A/ja
Publication of JPS57131227A publication Critical patent/JPS57131227A/ja
Publication of JPH0153291B2 publication Critical patent/JPH0153291B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Macromonomer-Based Addition Polymer (AREA)
  • Electron Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP1684081A 1981-02-09 1981-02-09 Photopolymer and its production Granted JPS57131227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1684081A JPS57131227A (en) 1981-02-09 1981-02-09 Photopolymer and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1684081A JPS57131227A (en) 1981-02-09 1981-02-09 Photopolymer and its production

Publications (2)

Publication Number Publication Date
JPS57131227A true JPS57131227A (en) 1982-08-14
JPH0153291B2 JPH0153291B2 (enrdf_load_stackoverflow) 1989-11-13

Family

ID=11927396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1684081A Granted JPS57131227A (en) 1981-02-09 1981-02-09 Photopolymer and its production

Country Status (1)

Country Link
JP (1) JPS57131227A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108031A (ja) * 1982-12-13 1984-06-22 Ube Ind Ltd 感光性ポリイミド
JPS59145216A (ja) * 1983-02-07 1984-08-20 Ube Ind Ltd 有機溶媒可溶性の感光性ポリアミドイミド
JPS59210939A (ja) * 1983-05-13 1984-11-29 Toyobo Co Ltd 架橋したポリエ−テルイミド成形物
JPS6157620A (ja) * 1984-08-30 1986-03-24 Ube Ind Ltd 有機溶媒可溶性の感光性ポリイミド
US6025461A (en) * 1997-09-26 2000-02-15 Nippon Mektron, Limited Photosensitive polyimide
US6077924A (en) * 1998-05-01 2000-06-20 Nipopon Mektron Limited Polyimides, process for producing the same and photosensitive composition containing the same
US6096850A (en) * 1998-05-14 2000-08-01 Nippon Mektron Limited Polyimides, process for producing the same and photosensitive composition containing the same
US6232039B1 (en) 1998-05-14 2001-05-15 Nippon Mektron Limited Photosensitive composition
US6245484B1 (en) 1998-05-14 2001-06-12 Nippon Mektron Limited Polymides, process for producing the same and photosensitive composition the same
JP2008531782A (ja) * 2005-12-01 2008-08-14 エルジー・ケム・リミテッド 新規なポリイミドおよびその製造方法
CN107438654A (zh) * 2016-03-28 2017-12-05 株式会社Lg化学 液晶取向剂、包含其的液晶取向层及制备液晶取向层的方法
CN111675807A (zh) * 2020-06-17 2020-09-18 东华大学 一种可紫外光激发自交联型水溶性3d打印墨水

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9247312B2 (en) 2011-01-05 2016-01-26 Sonic Ip, Inc. Systems and methods for encoding source media in matroska container files for adaptive bitrate streaming using hypertext transfer protocol

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108031A (ja) * 1982-12-13 1984-06-22 Ube Ind Ltd 感光性ポリイミド
JPS59145216A (ja) * 1983-02-07 1984-08-20 Ube Ind Ltd 有機溶媒可溶性の感光性ポリアミドイミド
JPS59210939A (ja) * 1983-05-13 1984-11-29 Toyobo Co Ltd 架橋したポリエ−テルイミド成形物
JPS6157620A (ja) * 1984-08-30 1986-03-24 Ube Ind Ltd 有機溶媒可溶性の感光性ポリイミド
US6025461A (en) * 1997-09-26 2000-02-15 Nippon Mektron, Limited Photosensitive polyimide
US6077924A (en) * 1998-05-01 2000-06-20 Nipopon Mektron Limited Polyimides, process for producing the same and photosensitive composition containing the same
US6096850A (en) * 1998-05-14 2000-08-01 Nippon Mektron Limited Polyimides, process for producing the same and photosensitive composition containing the same
US6232039B1 (en) 1998-05-14 2001-05-15 Nippon Mektron Limited Photosensitive composition
US6245484B1 (en) 1998-05-14 2001-06-12 Nippon Mektron Limited Polymides, process for producing the same and photosensitive composition the same
US6365324B1 (en) 1998-05-14 2002-04-02 Nippon Mektron, Limited Photosensitive composition
US6486290B1 (en) 1998-05-14 2002-11-26 Nippon Mektron, Limited Polyimides, process for producing the same and photosensitive composition containing the same
US6582885B2 (en) 1998-05-14 2003-06-24 Nippon Mektron, Ltd. Polyimides, process for producing the same and photosensitive composition containing the same
JP2008531782A (ja) * 2005-12-01 2008-08-14 エルジー・ケム・リミテッド 新規なポリイミドおよびその製造方法
CN107438654A (zh) * 2016-03-28 2017-12-05 株式会社Lg化学 液晶取向剂、包含其的液晶取向层及制备液晶取向层的方法
US10526540B2 (en) 2016-03-28 2020-01-07 Lg Chem, Ltd. Liquid crystal aligning agent, liquid crystal alignment layer comprising the same and method for preparing liquid crystal alignment layer
CN107438654B (zh) * 2016-03-28 2020-08-14 株式会社Lg化学 液晶取向剂、包含其的液晶取向层及制备液晶取向层的方法
CN111675807A (zh) * 2020-06-17 2020-09-18 东华大学 一种可紫外光激发自交联型水溶性3d打印墨水

Also Published As

Publication number Publication date
JPH0153291B2 (enrdf_load_stackoverflow) 1989-11-13

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