JPS5712546A - Semiconductor device and its manufacture - Google Patents
Semiconductor device and its manufactureInfo
- Publication number
- JPS5712546A JPS5712546A JP8583780A JP8583780A JPS5712546A JP S5712546 A JPS5712546 A JP S5712546A JP 8583780 A JP8583780 A JP 8583780A JP 8583780 A JP8583780 A JP 8583780A JP S5712546 A JPS5712546 A JP S5712546A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- layers
- type
- substrate
- bipolar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- 230000000295 complement effect Effects 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
- H01L27/0826—Combination of vertical complementary transistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
PURPOSE:To obtain the complemetnary type device in few processes by forming a PNP bipolar transistor while utilizing a forming process of a bipolar NPN transistor in the cnventional structure. CONSTITUTION:P layes 4, 5 are formed to an N<-> epitaxial layer 3 on a P type Si substrate 1 with an N<+> buried layer 2, and connected to the substrate 1. N layers 6, 7 are shaped to the inside of the P layer 4 and the N<-> layer 3 above the buried layer, P<+> layers 8, 9, 10 are each molded into the P layer 4, the N layer 6 and the N layer 3 above the buried layer 2, and N<+> layers 11, 12 are formed selectively to the N layer 6 and the P<+> layer 10. Thus, the layers 4-6-8 and the layers 3-10-12 respectively constitute the bipolar type PNP and NPN transistors. The surface is coated with an oxide film, an electrode is attached and the complementary type device is completed. According to this constitution, processes can be decreased as compared to conentional devices, frequency cutoff is higher than a conventional substrate collector type transistor and a high-frequency characteristic is improved largely.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8583780A JPS5712546A (en) | 1980-06-26 | 1980-06-26 | Semiconductor device and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8583780A JPS5712546A (en) | 1980-06-26 | 1980-06-26 | Semiconductor device and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5712546A true JPS5712546A (en) | 1982-01-22 |
JPS639667B2 JPS639667B2 (en) | 1988-03-01 |
Family
ID=13869967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8583780A Granted JPS5712546A (en) | 1980-06-26 | 1980-06-26 | Semiconductor device and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5712546A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0254570A (en) * | 1988-08-18 | 1990-02-23 | Fuji Electric Co Ltd | Integrated circuit device |
EP0792514A1 (en) * | 1994-11-04 | 1997-09-03 | Analog Devices, Incorporated | Integrated circuit with complementary isolated bipolar transitors and method of making same |
-
1980
- 1980-06-26 JP JP8583780A patent/JPS5712546A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0254570A (en) * | 1988-08-18 | 1990-02-23 | Fuji Electric Co Ltd | Integrated circuit device |
EP0792514A1 (en) * | 1994-11-04 | 1997-09-03 | Analog Devices, Incorporated | Integrated circuit with complementary isolated bipolar transitors and method of making same |
EP0792514A4 (en) * | 1994-11-04 | 1998-06-17 | Analog Devices Inc | Integrated circuit with complementary isolated bipolar transitors and method of making same |
Also Published As
Publication number | Publication date |
---|---|
JPS639667B2 (en) | 1988-03-01 |
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