JPS57124451A - Semiconductor ic device - Google Patents
Semiconductor ic deviceInfo
- Publication number
- JPS57124451A JPS57124451A JP56008947A JP894781A JPS57124451A JP S57124451 A JPS57124451 A JP S57124451A JP 56008947 A JP56008947 A JP 56008947A JP 894781 A JP894781 A JP 894781A JP S57124451 A JPS57124451 A JP S57124451A
- Authority
- JP
- Japan
- Prior art keywords
- region
- isolating
- compensation
- caused
- collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 238000000034 method Methods 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000005299 abrasion Methods 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56008947A JPS57124451A (en) | 1981-01-26 | 1981-01-26 | Semiconductor ic device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56008947A JPS57124451A (en) | 1981-01-26 | 1981-01-26 | Semiconductor ic device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57124451A true JPS57124451A (en) | 1982-08-03 |
JPS6226181B2 JPS6226181B2 (enrdf_load_stackoverflow) | 1987-06-08 |
Family
ID=11706858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56008947A Granted JPS57124451A (en) | 1981-01-26 | 1981-01-26 | Semiconductor ic device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57124451A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6388839A (ja) * | 1986-09-26 | 1988-04-19 | エイ・ティ・アンド・ティ・コーポレーション | 埋没導電層を有する誘電的に分離されたデバイスの製造方法 |
US5387817A (en) * | 1991-12-02 | 1995-02-07 | Oki Electric Industry Co., Ltd. | Dielectric isolation substrate having single-crystal silicon islands surrounded by groove and lower conductive layer filling the groove therewith |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5075780A (enrdf_load_stackoverflow) * | 1973-11-07 | 1975-06-21 |
-
1981
- 1981-01-26 JP JP56008947A patent/JPS57124451A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5075780A (enrdf_load_stackoverflow) * | 1973-11-07 | 1975-06-21 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6388839A (ja) * | 1986-09-26 | 1988-04-19 | エイ・ティ・アンド・ティ・コーポレーション | 埋没導電層を有する誘電的に分離されたデバイスの製造方法 |
US5387817A (en) * | 1991-12-02 | 1995-02-07 | Oki Electric Industry Co., Ltd. | Dielectric isolation substrate having single-crystal silicon islands surrounded by groove and lower conductive layer filling the groove therewith |
Also Published As
Publication number | Publication date |
---|---|
JPS6226181B2 (enrdf_load_stackoverflow) | 1987-06-08 |
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