JPS57118246A - Method and device for correcting white spot defect of photomask - Google Patents

Method and device for correcting white spot defect of photomask

Info

Publication number
JPS57118246A
JPS57118246A JP304481A JP304481A JPS57118246A JP S57118246 A JPS57118246 A JP S57118246A JP 304481 A JP304481 A JP 304481A JP 304481 A JP304481 A JP 304481A JP S57118246 A JPS57118246 A JP S57118246A
Authority
JP
Japan
Prior art keywords
light
irradiated
photomask
white spot
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP304481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237388B2 (cg-RX-API-DMAC7.html
Inventor
Katsuro Mizukoshi
Mikio Hongo
Masaaki Okunaka
Takeoki Miyauchi
Masao Mitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP304481A priority Critical patent/JPS57118246A/ja
Priority to US06/338,864 priority patent/US4444801A/en
Publication of JPS57118246A publication Critical patent/JPS57118246A/ja
Publication of JPS6237388B2 publication Critical patent/JPS6237388B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/225—Correcting or repairing of printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP304481A 1981-01-14 1981-01-14 Method and device for correcting white spot defect of photomask Granted JPS57118246A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP304481A JPS57118246A (en) 1981-01-14 1981-01-14 Method and device for correcting white spot defect of photomask
US06/338,864 US4444801A (en) 1981-01-14 1982-01-12 Method and apparatus for correcting transparent defects on a photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP304481A JPS57118246A (en) 1981-01-14 1981-01-14 Method and device for correcting white spot defect of photomask

Publications (2)

Publication Number Publication Date
JPS57118246A true JPS57118246A (en) 1982-07-23
JPS6237388B2 JPS6237388B2 (cg-RX-API-DMAC7.html) 1987-08-12

Family

ID=11546306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP304481A Granted JPS57118246A (en) 1981-01-14 1981-01-14 Method and device for correcting white spot defect of photomask

Country Status (1)

Country Link
JP (1) JPS57118246A (cg-RX-API-DMAC7.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222838A (ja) * 1983-06-01 1984-12-14 Toppan Printing Co Ltd 欠陥修正装置
JPS6114640A (ja) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド フオトマスクの欠陥修正方法及び装置
JPH01106062A (ja) * 1987-10-20 1989-04-24 Nec Corp フォトマスク白点欠陥修正装置
JP2007523492A (ja) * 2004-02-19 2007-08-16 モレキュラー・インプリンツ・インコーポレーテッド 基板の上に配置された膜の特性を測定する方法およびシステム
US8206775B2 (en) 2008-01-31 2012-06-26 Hitachi Displays, Ltd. Method for repairing pattern defect on electronic circuit and apparatus therefor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5120676A (en) * 1974-08-14 1976-02-19 Dainippon Printing Co Ltd Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5120676A (en) * 1974-08-14 1976-02-19 Dainippon Printing Co Ltd Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222838A (ja) * 1983-06-01 1984-12-14 Toppan Printing Co Ltd 欠陥修正装置
JPS6114640A (ja) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド フオトマスクの欠陥修正方法及び装置
JPH01106062A (ja) * 1987-10-20 1989-04-24 Nec Corp フォトマスク白点欠陥修正装置
JP2007523492A (ja) * 2004-02-19 2007-08-16 モレキュラー・インプリンツ・インコーポレーテッド 基板の上に配置された膜の特性を測定する方法およびシステム
US8206775B2 (en) 2008-01-31 2012-06-26 Hitachi Displays, Ltd. Method for repairing pattern defect on electronic circuit and apparatus therefor

Also Published As

Publication number Publication date
JPS6237388B2 (cg-RX-API-DMAC7.html) 1987-08-12

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