JPS57118246A - Method and device for correcting white spot defect of photomask - Google Patents
Method and device for correcting white spot defect of photomaskInfo
- Publication number
- JPS57118246A JPS57118246A JP304481A JP304481A JPS57118246A JP S57118246 A JPS57118246 A JP S57118246A JP 304481 A JP304481 A JP 304481A JP 304481 A JP304481 A JP 304481A JP S57118246 A JPS57118246 A JP S57118246A
- Authority
- JP
- Japan
- Prior art keywords
- light
- irradiated
- photomask
- white spot
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/225—Correcting or repairing of printed circuits
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP304481A JPS57118246A (en) | 1981-01-14 | 1981-01-14 | Method and device for correcting white spot defect of photomask |
US06/338,864 US4444801A (en) | 1981-01-14 | 1982-01-12 | Method and apparatus for correcting transparent defects on a photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP304481A JPS57118246A (en) | 1981-01-14 | 1981-01-14 | Method and device for correcting white spot defect of photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57118246A true JPS57118246A (en) | 1982-07-23 |
JPS6237388B2 JPS6237388B2 (ja) | 1987-08-12 |
Family
ID=11546306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP304481A Granted JPS57118246A (en) | 1981-01-14 | 1981-01-14 | Method and device for correcting white spot defect of photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57118246A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59222838A (ja) * | 1983-06-01 | 1984-12-14 | Toppan Printing Co Ltd | 欠陥修正装置 |
JPS6114640A (ja) * | 1984-06-20 | 1986-01-22 | グールド・インコーポレイテツド | フオトマスクの欠陥修正方法及び装置 |
JPH01106062A (ja) * | 1987-10-20 | 1989-04-24 | Nec Corp | フォトマスク白点欠陥修正装置 |
JP2007523492A (ja) * | 2004-02-19 | 2007-08-16 | モレキュラー・インプリンツ・インコーポレーテッド | 基板の上に配置された膜の特性を測定する方法およびシステム |
US8206775B2 (en) | 2008-01-31 | 2012-06-26 | Hitachi Displays, Ltd. | Method for repairing pattern defect on electronic circuit and apparatus therefor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5120676A (en) * | 1974-08-14 | 1976-02-19 | Dainippon Printing Co Ltd | Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi |
-
1981
- 1981-01-14 JP JP304481A patent/JPS57118246A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5120676A (en) * | 1974-08-14 | 1976-02-19 | Dainippon Printing Co Ltd | Fuotomasukuno fushokudoaino kenshutsuhohooyobisochi |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59222838A (ja) * | 1983-06-01 | 1984-12-14 | Toppan Printing Co Ltd | 欠陥修正装置 |
JPH0466020B2 (ja) * | 1983-06-01 | 1992-10-21 | Toppan Printing Co Ltd | |
JPS6114640A (ja) * | 1984-06-20 | 1986-01-22 | グールド・インコーポレイテツド | フオトマスクの欠陥修正方法及び装置 |
JPH01106062A (ja) * | 1987-10-20 | 1989-04-24 | Nec Corp | フォトマスク白点欠陥修正装置 |
JP2007523492A (ja) * | 2004-02-19 | 2007-08-16 | モレキュラー・インプリンツ・インコーポレーテッド | 基板の上に配置された膜の特性を測定する方法およびシステム |
US8206775B2 (en) | 2008-01-31 | 2012-06-26 | Hitachi Displays, Ltd. | Method for repairing pattern defect on electronic circuit and apparatus therefor |
Also Published As
Publication number | Publication date |
---|---|
JPS6237388B2 (ja) | 1987-08-12 |
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