JPS5711811A - Preparation of carbide film resistor - Google Patents
Preparation of carbide film resistorInfo
- Publication number
- JPS5711811A JPS5711811A JP8554980A JP8554980A JPS5711811A JP S5711811 A JPS5711811 A JP S5711811A JP 8554980 A JP8554980 A JP 8554980A JP 8554980 A JP8554980 A JP 8554980A JP S5711811 A JPS5711811 A JP S5711811A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- carbide
- film resistor
- carbide film
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 4
- 239000012535 impurity Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
- 239000013077 target material Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8554980A JPS5711811A (en) | 1980-06-23 | 1980-06-23 | Preparation of carbide film resistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8554980A JPS5711811A (en) | 1980-06-23 | 1980-06-23 | Preparation of carbide film resistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5711811A true JPS5711811A (en) | 1982-01-21 |
JPS6323267B2 JPS6323267B2 (enrdf_load_stackoverflow) | 1988-05-16 |
Family
ID=13861919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8554980A Granted JPS5711811A (en) | 1980-06-23 | 1980-06-23 | Preparation of carbide film resistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5711811A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60106960A (ja) * | 1983-09-23 | 1985-06-12 | カロライナ・コーテイング・テクノロジーズ・インコーポレイテツド | 無秩序コ−テイング及び該コ−テイングの形成方法並びに該コ−テイングを施された工具を使用する工作物機械加工方法 |
-
1980
- 1980-06-23 JP JP8554980A patent/JPS5711811A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60106960A (ja) * | 1983-09-23 | 1985-06-12 | カロライナ・コーテイング・テクノロジーズ・インコーポレイテツド | 無秩序コ−テイング及び該コ−テイングの形成方法並びに該コ−テイングを施された工具を使用する工作物機械加工方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6323267B2 (enrdf_load_stackoverflow) | 1988-05-16 |
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