JPS57115856A - Compound semiconductor device - Google Patents
Compound semiconductor deviceInfo
- Publication number
- JPS57115856A JPS57115856A JP56001768A JP176881A JPS57115856A JP S57115856 A JPS57115856 A JP S57115856A JP 56001768 A JP56001768 A JP 56001768A JP 176881 A JP176881 A JP 176881A JP S57115856 A JPS57115856 A JP S57115856A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- constitution
- field effect
- row
- display device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 150000001875 compounds Chemical class 0.000 title 1
- 230000005669 field effect Effects 0.000 abstract 3
- 239000011159 matrix material Substances 0.000 abstract 3
- 239000003990 capacitor Substances 0.000 abstract 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract 2
- 239000007787 solid Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78642—Vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78681—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising AIIIBV or AIIBVI or AIVBVI semiconductor materials, or Se or Te
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78684—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising semiconductor materials of Group IV not being silicon, or alloys including an element of the group IV, e.g. Ge, SiN alloys, SiC alloys
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56001768A JPS57115856A (en) | 1981-01-09 | 1981-01-09 | Compound semiconductor device |
US06/338,658 US4470060A (en) | 1981-01-09 | 1982-01-11 | Liquid crystal display with vertical non-single crystal semiconductor field effect transistors |
US06/633,251 US4668969A (en) | 1981-01-09 | 1984-07-23 | Vertical non-single crystal semiconductor field effect transistor |
US07/062,335 US4829358A (en) | 1981-01-09 | 1987-06-09 | Apparatus with field effect transistor having reduced channel length |
US07/062,337 US4816886A (en) | 1981-01-09 | 1987-06-09 | Apparatus with field effect transistor having reduced channel length |
JP1326552A JPH02210330A (ja) | 1981-01-09 | 1989-12-15 | 液晶電気光学装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56001768A JPS57115856A (en) | 1981-01-09 | 1981-01-09 | Compound semiconductor device |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1326551A Division JPH02230130A (ja) | 1989-12-15 | 1989-12-15 | 液晶電気光学装置 |
JP1326552A Division JPH02210330A (ja) | 1981-01-09 | 1989-12-15 | 液晶電気光学装置 |
JP1326553A Division JPH02217826A (ja) | 1989-12-15 | 1989-12-15 | 液晶電気光学装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57115856A true JPS57115856A (en) | 1982-07-19 |
JPS6366428B2 JPS6366428B2 (ja) | 1988-12-20 |
Family
ID=11510753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56001768A Granted JPS57115856A (en) | 1981-01-09 | 1981-01-09 | Compound semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57115856A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60177380A (ja) * | 1984-02-23 | 1985-09-11 | 株式会社半導体エネルギー研究所 | 固体表示装置 |
US5162901A (en) * | 1989-05-26 | 1992-11-10 | Sharp Kabushiki Kaisha | Active-matrix display device with added capacitance electrode wire and secondary wire connected thereto |
US6271066B1 (en) | 1991-03-18 | 2001-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and method for forming the same and thin film transistor |
US6562672B2 (en) | 1991-03-18 | 2003-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and method for forming the same and thin film transistor |
JP2005049832A (ja) * | 2003-07-14 | 2005-02-24 | Semiconductor Energy Lab Co Ltd | 液晶表示装置 |
-
1981
- 1981-01-09 JP JP56001768A patent/JPS57115856A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60177380A (ja) * | 1984-02-23 | 1985-09-11 | 株式会社半導体エネルギー研究所 | 固体表示装置 |
JPH0473764B2 (ja) * | 1984-02-23 | 1992-11-24 | ||
US5162901A (en) * | 1989-05-26 | 1992-11-10 | Sharp Kabushiki Kaisha | Active-matrix display device with added capacitance electrode wire and secondary wire connected thereto |
US6271066B1 (en) | 1991-03-18 | 2001-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and method for forming the same and thin film transistor |
US6562672B2 (en) | 1991-03-18 | 2003-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and method for forming the same and thin film transistor |
JP2005049832A (ja) * | 2003-07-14 | 2005-02-24 | Semiconductor Energy Lab Co Ltd | 液晶表示装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6366428B2 (ja) | 1988-12-20 |
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