JPS5711338A - Film photoresist having laminate structure - Google Patents
Film photoresist having laminate structureInfo
- Publication number
- JPS5711338A JPS5711338A JP8478080A JP8478080A JPS5711338A JP S5711338 A JPS5711338 A JP S5711338A JP 8478080 A JP8478080 A JP 8478080A JP 8478080 A JP8478080 A JP 8478080A JP S5711338 A JPS5711338 A JP S5711338A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- polymer
- film
- compound
- 100pts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 4
- 229920001577 copolymer Polymers 0.000 abstract 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 238000010030 laminating Methods 0.000 abstract 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
- 244000028419 Styrax benzoin Species 0.000 abstract 1
- 235000000126 Styrax benzoin Nutrition 0.000 abstract 1
- 235000008411 Sumatra benzointree Nutrition 0.000 abstract 1
- -1 azide compound Chemical class 0.000 abstract 1
- 229960002130 benzoin Drugs 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 235000019382 gum benzoic Nutrition 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 1
- 238000007363 ring formation reaction Methods 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8478080A JPS5711338A (en) | 1980-06-23 | 1980-06-23 | Film photoresist having laminate structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8478080A JPS5711338A (en) | 1980-06-23 | 1980-06-23 | Film photoresist having laminate structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5711338A true JPS5711338A (en) | 1982-01-21 |
| JPS6349209B2 JPS6349209B2 (enrdf_load_stackoverflow) | 1988-10-04 |
Family
ID=13840198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8478080A Granted JPS5711338A (en) | 1980-06-23 | 1980-06-23 | Film photoresist having laminate structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5711338A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6187152A (ja) * | 1984-09-13 | 1986-05-02 | エム・アンド・ティ−・ケミカルズ・インコ−ポレ−テッド | 回路痕跡全体にわたるスクリ−ン塗被用高分解能ソルダ−マスク感光性ポリマ−及びその生成法 |
| US4643963A (en) * | 1983-11-03 | 1987-02-17 | Basf Aktiengesellschaft | Photopolymerizable recording materials containing cyclic pentadienes for the production of printing plates, and the production of printing plates using these recording materials |
| JPH01221735A (ja) * | 1988-02-29 | 1989-09-05 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
-
1980
- 1980-06-23 JP JP8478080A patent/JPS5711338A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4643963A (en) * | 1983-11-03 | 1987-02-17 | Basf Aktiengesellschaft | Photopolymerizable recording materials containing cyclic pentadienes for the production of printing plates, and the production of printing plates using these recording materials |
| JPS6187152A (ja) * | 1984-09-13 | 1986-05-02 | エム・アンド・ティ−・ケミカルズ・インコ−ポレ−テッド | 回路痕跡全体にわたるスクリ−ン塗被用高分解能ソルダ−マスク感光性ポリマ−及びその生成法 |
| JPH01221735A (ja) * | 1988-02-29 | 1989-09-05 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6349209B2 (enrdf_load_stackoverflow) | 1988-10-04 |
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