ATE36416T1 - Photopolymerisierbarer verbundstoff. - Google Patents

Photopolymerisierbarer verbundstoff.

Info

Publication number
ATE36416T1
ATE36416T1 AT84303071T AT84303071T ATE36416T1 AT E36416 T1 ATE36416 T1 AT E36416T1 AT 84303071 T AT84303071 T AT 84303071T AT 84303071 T AT84303071 T AT 84303071T AT E36416 T1 ATE36416 T1 AT E36416T1
Authority
AT
Austria
Prior art keywords
weight
image
photopolymerizable
photopolymerizable layer
layer
Prior art date
Application number
AT84303071T
Other languages
English (en)
Inventor
Hideo Ai
Akihiko Ikeda
Jiro Sato
Original Assignee
Asahi Chemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=13718455&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE36416(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Chemical Ind filed Critical Asahi Chemical Ind
Application granted granted Critical
Publication of ATE36416T1 publication Critical patent/ATE36416T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AT84303071T 1983-05-09 1984-05-08 Photopolymerisierbarer verbundstoff. ATE36416T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58080445A JPS59204837A (ja) 1983-05-09 1983-05-09 光重合性積層体及びそれを用いたレジスト像形成方法
EP84303071A EP0125862B1 (de) 1983-05-09 1984-05-08 Photopolymerisierbarer Verbundstoff

Publications (1)

Publication Number Publication Date
ATE36416T1 true ATE36416T1 (de) 1988-08-15

Family

ID=13718455

Family Applications (1)

Application Number Title Priority Date Filing Date
AT84303071T ATE36416T1 (de) 1983-05-09 1984-05-08 Photopolymerisierbarer verbundstoff.

Country Status (6)

Country Link
US (1) US4702997A (de)
EP (1) EP0125862B1 (de)
JP (1) JPS59204837A (de)
KR (1) KR860001398B1 (de)
AT (1) ATE36416T1 (de)
DE (1) DE3473357D1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197401A (ja) * 1983-04-26 1984-11-09 Nippon Oil & Fats Co Ltd 光重合開始剤
DE3588111T2 (de) * 1985-06-29 1996-10-31 Asahi Chem Res Lab Kunststoffzusammensetzung für Lötschutztinte
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
JP2548016B2 (ja) * 1986-09-09 1996-10-30 旭化成工業株式会社 光重合性積層体
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
JP2690494B2 (ja) * 1988-03-04 1997-12-10 旭化成工業株式会社 光レジスト組成物
JP2644898B2 (ja) * 1989-11-16 1997-08-25 旭化成工業株式会社 レリーフ形成用感光性樹脂組成物
JP2977265B2 (ja) * 1990-11-19 1999-11-15 旭化成工業株式会社 感光性エラストマー構成体
DE4129284A1 (de) * 1991-09-03 1993-03-04 Agfa Gevaert Ag Bilderzeugungselement mit einem fotopolymerisierbaren monomer
EP0545081B1 (de) * 1991-11-01 1998-12-23 MacDermid Imaging Technology Inc. Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
TW424172B (en) 1995-04-19 2001-03-01 Hitachi Chemical Co Ltd Photosensitive resin composition and photosensitive element using the same
US5814431A (en) * 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
US6207347B1 (en) * 1998-05-29 2001-03-27 Nichigo-Morton Co. Ltd. Photoimageable composition having improved flexibility
DE10345903B4 (de) * 2003-06-25 2012-05-31 Daimler Ag Reaktive thermisch oder kombiniert thermisch und UV-initiiert härtbare Lacke, deren Verwendung sowie Verfahren zu deren Härtung
EP1682161A4 (de) * 2003-10-29 2011-12-07 Gentis Inc Polymerisierbare emulsionen für die gewebeherstellung

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2064079C2 (de) * 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
US4088498A (en) * 1970-12-28 1978-05-09 Hoechst Aktiengesellschaft Photopolymerizable copying composition
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
US4296196A (en) * 1978-05-20 1981-10-20 Hoechst Aktiengesellschaft Photopolymerizable mixture in a transfer element
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3048502A1 (de) * 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US4438190A (en) * 1981-03-04 1984-03-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates

Also Published As

Publication number Publication date
JPS59204837A (ja) 1984-11-20
EP0125862A2 (de) 1984-11-21
DE3473357D1 (de) 1988-09-15
EP0125862B1 (de) 1988-08-10
KR840008844A (ko) 1984-12-19
US4702997A (en) 1987-10-27
KR860001398B1 (ko) 1986-09-22
EP0125862A3 (en) 1985-05-08

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
RZN Patent revoked