ATE36416T1 - Photopolymerisierbarer verbundstoff. - Google Patents
Photopolymerisierbarer verbundstoff.Info
- Publication number
- ATE36416T1 ATE36416T1 AT84303071T AT84303071T ATE36416T1 AT E36416 T1 ATE36416 T1 AT E36416T1 AT 84303071 T AT84303071 T AT 84303071T AT 84303071 T AT84303071 T AT 84303071T AT E36416 T1 ATE36416 T1 AT E36416T1
- Authority
- AT
- Austria
- Prior art keywords
- weight
- image
- photopolymerizable
- photopolymerizable layer
- layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58080445A JPS59204837A (ja) | 1983-05-09 | 1983-05-09 | 光重合性積層体及びそれを用いたレジスト像形成方法 |
EP84303071A EP0125862B1 (de) | 1983-05-09 | 1984-05-08 | Photopolymerisierbarer Verbundstoff |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE36416T1 true ATE36416T1 (de) | 1988-08-15 |
Family
ID=13718455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT84303071T ATE36416T1 (de) | 1983-05-09 | 1984-05-08 | Photopolymerisierbarer verbundstoff. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4702997A (de) |
EP (1) | EP0125862B1 (de) |
JP (1) | JPS59204837A (de) |
KR (1) | KR860001398B1 (de) |
AT (1) | ATE36416T1 (de) |
DE (1) | DE3473357D1 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59197401A (ja) * | 1983-04-26 | 1984-11-09 | Nippon Oil & Fats Co Ltd | 光重合開始剤 |
DE3588111T2 (de) * | 1985-06-29 | 1996-10-31 | Asahi Chem Res Lab | Kunststoffzusammensetzung für Lötschutztinte |
JPS62290705A (ja) * | 1986-06-10 | 1987-12-17 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
JP2548016B2 (ja) * | 1986-09-09 | 1996-10-30 | 旭化成工業株式会社 | 光重合性積層体 |
US5019482A (en) * | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
JP2690494B2 (ja) * | 1988-03-04 | 1997-12-10 | 旭化成工業株式会社 | 光レジスト組成物 |
JP2644898B2 (ja) * | 1989-11-16 | 1997-08-25 | 旭化成工業株式会社 | レリーフ形成用感光性樹脂組成物 |
JP2977265B2 (ja) * | 1990-11-19 | 1999-11-15 | 旭化成工業株式会社 | 感光性エラストマー構成体 |
DE4129284A1 (de) * | 1991-09-03 | 1993-03-04 | Agfa Gevaert Ag | Bilderzeugungselement mit einem fotopolymerisierbaren monomer |
EP0545081B1 (de) * | 1991-11-01 | 1998-12-23 | MacDermid Imaging Technology Inc. | Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen |
TW418346B (en) * | 1993-03-05 | 2001-01-11 | Ciba Sc Holding Ag | Photopolymerisable compositions containing tetraacrylates |
TW424172B (en) * | 1995-04-19 | 2001-03-01 | Hitachi Chemical Co Ltd | Photosensitive resin composition and photosensitive element using the same |
US5814431A (en) * | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
US6207347B1 (en) * | 1998-05-29 | 2001-03-27 | Nichigo-Morton Co. Ltd. | Photoimageable composition having improved flexibility |
DE10345903B4 (de) * | 2003-06-25 | 2012-05-31 | Daimler Ag | Reaktive thermisch oder kombiniert thermisch und UV-initiiert härtbare Lacke, deren Verwendung sowie Verfahren zu deren Härtung |
JP2007509716A (ja) * | 2003-10-29 | 2007-04-19 | ジェンティス インコーポレイテッド | 組織工学用の重合可能なエマルション |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4088498A (en) * | 1970-12-28 | 1978-05-09 | Hoechst Aktiengesellschaft | Photopolymerizable copying composition |
DE2064079C2 (de) * | 1970-12-28 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
DE2361041C3 (de) * | 1973-12-07 | 1980-08-14 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
US4296196A (en) * | 1978-05-20 | 1981-10-20 | Hoechst Aktiengesellschaft | Photopolymerizable mixture in a transfer element |
DE2822190A1 (de) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
DE3136818C2 (de) * | 1980-09-19 | 1990-08-02 | Hitachi Chemical Co., Ltd., Tokio/Tokyo | Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske |
JPS5764734A (en) * | 1980-10-08 | 1982-04-20 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element |
DE3048502A1 (de) * | 1980-12-22 | 1982-07-22 | Hoechst Ag, 6000 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
US4438190A (en) * | 1981-03-04 | 1984-03-20 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates |
-
1983
- 1983-05-09 JP JP58080445A patent/JPS59204837A/ja active Pending
-
1984
- 1984-05-07 KR KR1019840002472A patent/KR860001398B1/ko not_active IP Right Cessation
- 1984-05-08 AT AT84303071T patent/ATE36416T1/de not_active IP Right Cessation
- 1984-05-08 EP EP84303071A patent/EP0125862B1/de not_active Expired
- 1984-05-08 DE DE8484303071T patent/DE3473357D1/de not_active Expired
-
1986
- 1986-02-06 US US06/826,712 patent/US4702997A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR860001398B1 (ko) | 1986-09-22 |
EP0125862B1 (de) | 1988-08-10 |
JPS59204837A (ja) | 1984-11-20 |
KR840008844A (ko) | 1984-12-19 |
EP0125862A3 (en) | 1985-05-08 |
US4702997A (en) | 1987-10-27 |
EP0125862A2 (de) | 1984-11-21 |
DE3473357D1 (de) | 1988-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
RZN | Patent revoked |